Advances in chemical mechanical planarization (CMP)

• Other Authors: Babu, S. V. (Editor)
• Format: Electronic eBook
• Language: English
• Published: Waltham, MA : Woodhead Publishing, [2016]
• Series: Woodhead Publishing series in electronic and optical materials ; no. 86.
• Subjects: Chemical mechanical planarization.; Nanoelectronics.; Microelectronics.; elektronické knihy; electronic books
• ISBN: 9780081002186; 0081002181; 9780081001653; 0081001657
• Physical Description: 1 online resource

Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planar...