Electromigration in thin films and electronic devices : materials and reliability

Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...

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Bibliographic Details
Other Authors Kim, Choong-Un
Format Electronic eBook
LanguageEnglish
Published Oxford : Woodhead Pub., 2011.
SeriesWoodhead Publishing in materials.
Subjects
Online AccessFull text
ISBN0857093754
9780857093752
1845699378
9781845699376
1613443919
9781613443910
Physical Description1 online resource (xii, 329 pages) : illustrations.

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