Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

• Other Authors: Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. 1937-
• Format: eBook
• Language: English
• Published: Park Ridge, N.J. : Noyes Publications, ©1990.
• Series: Materials science and process technology series.
• Subjects: Plasma engineering.; Semiconductors > Etching.; Plasma etching.; elektronické knihy; electronic books
• ISBN: 1591242975; 9781591242970; 9780815512202; 0815512201
• Physical Description: 1 online resource (xxiii, 523 pages) : illustrations

An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.