Optical lithography here is why

• Main Author: Lin, Burn Jeng, 1942-
• Corporate Author: SPIE (Society)
• Format: eBook
• Language: English
• Published: Bellingham, Wash. : SPIE, 2010.
• Series: SPIE monograph ; PM190.
• Subjects: Microlithography.; Semiconductors > Etching.; Lasers > Industrial applications.; elektronické knihy; electronic books
• ISBN: 9780819481825; 9781615837274; 9780819475602
• Physical Description: 1 online zdroj (xiv, 477 pages) : illustrations.

This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the...