Technology evolution for silicon nano-electronics selected, peer reviewed papers from the proceedings of the International Symposium on Technology Evolution for Silicon Nano-Electronics 2010, June 3-5, 2010, Tokyo Institute of Technology, Tokyo, Japan

• Corporate Author: International Symposium on Technology Evolution for Silicon Nano-Electronics Tokyo Institute of Technology
• Other Authors: Miyazaki, Seiichi, Tabata, Hitoshi
• Format: eBook
• Language: English
• Published: Stafa-Zurich, Switzerland ; Enfield, N.H. : Trans Tech Publications, c2011.
• Series: Key engineering materials ; v. 470.
• Subjects: Nanoelectronics > Congresses.; Nanostructured materials > Congresses.; Metal oxide semiconductors > Congresses.; elektronické knihy; electronic books
• ISBN: 9783038134947; 9781628705164; 9783037850510
• ISSN: 1013-9826 ;
• Physical Description: 1 online zdroj (xi, 234 p. :) ill.

Silicon ultra-large scale integrated circuits (ULSIs) are now faced with various physical limits to further scaling. Therefore, it is very important to establish the fundamental science and technology required to produce nano-scale complementary metal-oxide-semiconductor devices (Nano-CMOS) having h...