Determining the thickness of semitransparent thin films via reflectivity measurements based on optical properties
This study addresses the challenge of measuring deposited film thickness during semiconductor manufacturing in real-time. Accordingly, we present the development of a sensor capable of measuring the deposition and growth thickness of wafers within a chamber in situ. Using a laser measurement instrum...
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| Published in | Journal of mechanical science and technology pp. 3557 - 3562 |
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| Main Authors | , , , , |
| Format | Journal Article |
| Language | English |
| Published |
대한기계학회
01.07.2024
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1738-494X 1976-3824 |
| DOI | 10.1007/s12206-024-0628-5 |
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| Abstract | This study addresses the challenge of measuring deposited film thickness during semiconductor manufacturing in real-time. Accordingly, we present the development of a sensor capable of measuring the deposition and growth thickness of wafers within a chamber in situ. Using a laser measurement instrument, we designed a sensor equipped with a lightreceiving component to capture the reflected light signals. Our experimental results confirm the feasibility of real-time measurements; the oxide and nitride films are measured with a deviation of 10 nm or less and a minimum error factor as low as 0.68 %. This sensor is promising for improving the efficiency and accuracy of film thickness measurements in semiconductor manufacturing processes. KCI Citation Count: 0 |
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| AbstractList | This study addresses the challenge of measuring deposited film thickness during semiconductor manufacturing in real-time. Accordingly, we present the development of a sensor capable of measuring the deposition and growth thickness of wafers within a chamber in situ. Using a laser measurement instrument, we designed a sensor equipped with a lightreceiving component to capture the reflected light signals. Our experimental results confirm the feasibility of real-time measurements; the oxide and nitride films are measured with a deviation of 10 nm or less and a minimum error factor as low as 0.68 %. This sensor is promising for improving the efficiency and accuracy of film thickness measurements in semiconductor manufacturing processes. KCI Citation Count: 0 |
| Author | Jong Jin Hwang Seung Jae Moon Jiyoung Park Hee-Lak Lee Choong-Mo Ryu |
| Author_xml | – sequence: 1 fullname: Jong Jin Hwang organization: (Department of Mechanical Convergence Engineering, Hanyang University) – sequence: 2 fullname: Hee-Lak Lee organization: (Department of Mechanical Convergence Engineering, Hanyang University) – sequence: 3 fullname: Choong-Mo Ryu organization: (Department of Mechanical Convergence Engineering, Hanyang University) – sequence: 4 fullname: Jiyoung Park organization: (Department of Mechanical Convergence Engineering, Hanyang University) – sequence: 5 fullname: Seung Jae Moon organization: (Department of Mechanical Convergence Engineering, Hanyang University) |
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| Title | Determining the thickness of semitransparent thin films via reflectivity measurements based on optical properties |
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