Determining the thickness of semitransparent thin films via reflectivity measurements based on optical properties

This study addresses the challenge of measuring deposited film thickness during semiconductor manufacturing in real-time. Accordingly, we present the development of a sensor capable of measuring the deposition and growth thickness of wafers within a chamber in situ. Using a laser measurement instrum...

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Bibliographic Details
Published inJournal of mechanical science and technology pp. 3557 - 3562
Main Authors Jong Jin Hwang, Hee-Lak Lee, Choong-Mo Ryu, Jiyoung Park, Seung Jae Moon
Format Journal Article
LanguageEnglish
Published 대한기계학회 01.07.2024
Subjects
기계공학
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ISSN1738-494X
1976-3824
DOI10.1007/s12206-024-0628-5

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Summary:This study addresses the challenge of measuring deposited film thickness during semiconductor manufacturing in real-time. Accordingly, we present the development of a sensor capable of measuring the deposition and growth thickness of wafers within a chamber in situ. Using a laser measurement instrument, we designed a sensor equipped with a lightreceiving component to capture the reflected light signals. Our experimental results confirm the feasibility of real-time measurements; the oxide and nitride films are measured with a deviation of 10 nm or less and a minimum error factor as low as 0.68 %. This sensor is promising for improving the efficiency and accuracy of film thickness measurements in semiconductor manufacturing processes. KCI Citation Count: 0
ISSN:1738-494X
1976-3824
DOI:10.1007/s12206-024-0628-5