SENSOR DEVICE AND METHOD OF PRODUCING A SENSOR DEVICE BY DIRECT ATOMIC LAYER PROCESSING

• Main Authors: BORIE, Benjamin Jean, SANTUCCI, Simone, KUNDRATA, Ivan
• Format: Patent
• Language: English; French
• Published: 24.07.2025
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; METALLURGY; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TESTING

The disclosure relates to a sensor device and method for producing a sensor device, comprising a substrate and an array of sensing elements for interacting with an environment, wherein each sensing element includes a thin-film deposit of material on the substrate so as to provide the sensing elements with mutually different sensitivity properties. La divulgation concerne un dispositif capteur et un procédé de fabrication d'un dispositif capteur, comprenant un substrat et un réseau d'éléments de détection pour interagir avec un environnement, chaque élément de détection comprenant un dépôt d'un film mince de matériau sur le substrat de façon à fournir les éléments de détection ayant des propriétés de sensibilité mutuellement différentes.