E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE SAME

An E-beam exposure method may include receiving exposure information on a pattern subject to exposure, determining on beams and off beams of an E-beam exposure apparatus, determining an exposure time in an exposure process, performing the exposure process using the E-beam exposure apparatus, measuri...

Full description

Saved in:
Bibliographic Details
Main Author SHON, Jungwook
Format Patent
LanguageEnglish
Published 15.05.2025
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
Online AccessGet full text

Cover

More Information
Summary:An E-beam exposure method may include receiving exposure information on a pattern subject to exposure, determining on beams and off beams of an E-beam exposure apparatus, determining an exposure time in an exposure process, performing the exposure process using the E-beam exposure apparatus, measuring a current of the off beams on an aperture plate of the E-beam exposure apparatus, and a first determination of determining whether the current is within a reference range. If the current is not within the reference range in the first determination, the determining the exposure time may be performed and the exposure time may be changed.
Bibliography:Application Number: US202418667209