HARD LAMINATED FILM, METHOD OF MANUFACTURING THE SAME AND FILM-FORMING DEVICE

• Main Authors: TAKAHARA KAZUKI, YAMAMOTO KENJI, FUJII HIROFUMI, KUJIME SUSUMU
• Format: Patent
• Language: English
• Published: 06.12.2007
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; PERFORMING OPERATIONS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TRANSPORTING

A hard laminated film wherein a layer A and a layer B having specific compositions are deposited alternately so that the compositions of layer A and layer B are different. The thickness of layer A per layer is twice or more the thickness of layer B per layer, the thickness of layer B per layer is 0.5 nm or more, and the thickness of layer A per layer is 200 nm or less. Layer A has a cubic rock-salt crystal structure such as that of Ti, Cr, Al, V nitride, carbonitride or carbide, and layer B is a hard film having a crystal structure other than cubic such as that of BN, BCN, SiN, SiC, SiCN, B-C, Cu, CuN, CuCN or metallic Cu. Alternatively, layer A has a chemical composition satisfying the following formula (1), and layer B has a chemical composition satisfying the following formula (2). Cr(BaCbN1-a-b-cOc) Layer A 0<=a<=0.15, 0<=b<=0.3, 0<=c<=0.1, 0.2<=e<=1.1 (1) B1-s-tCsNt Layer B 0<=S 0.25, (1-s-t)/t<=1.5 (2) Alternatively, Layer A has a specific atomic ratio composition of (Ti1-x-yAlxMy)(BaCbN1-a-b-cOc), and Layer B has one or more specific atomic ratio compositions selected from among the compositions B1-x-yCxNy, Si1-x-yCxNy, C1-xNx, Cu1-y(CxN1-x)y. Alternatively, Layer A has one of the following Compositional Formulae 1 or 2. Formula 1: (Ti1-x-yAlxMy), (BaCbN1-a-b-cOc), Formula 2: (Cr1-alphaXalpha)(BaCbN1-a-b-cOc)e (X is one or more metal elements selected from among Ti, Zr, Hf, V, Nb, Ta, Mo, W, Al, Si. Layer B has the following compositional formula 3. Formula 3: M(BaCbN1-a-b-cOc). M is one or more metal elements selected from among W, Mo, V, Nb.