OPTICAL SYSTEM ALIGNMENT METHOD FOR HOLE INSPECTION AND OPTICAL SYSTEM DEVICE USING THE SAME

• Main Authors: LEE SEOK WOO, KIM TAE GON, KIM HYO YOUNG
• Format: Patent
• Language: English; Korean
• Published: 03.03.2022
• Subjects: BORING; CALCULATING; COLORIMETRY; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOTDIRECTED TO A PARTICULAR RESULT; COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS; COMPUTING; COUNTING; DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g.ARRANGEMENTS FOR COPYING OR CONTROLLING; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MACHINE TOOLS; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OFPARTICULAR DETAILS OR COMPONENTS; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; METAL-WORKING NOT OTHERWISE PROVIDED FOR; PERFORMING OPERATIONS; PHYSICS; RADIATION PYROMETRY; TESTING; TRANSPORTING; TURNING

The present invention relates to an optical system alignment method for hole inspection and an optical system device controlled thereby. More specifically, the present invention relates to an optical system alignment method for hole inspection, which is able to correct an error of the optical system when inspecting a processing hole, and an optical system device controlled thereby. To this end, according to the present invention, the optical system alignment method for hole inspection comprises: a) a step of placing an optical unit on a processing hole; b) a step in which the optical unit placed on the processing hole photographs the processing hole; c) a step in which the optical unit provides an analysis unit with an image obtained by photographing the processing hole; d) a step in which the analysis unit determines whether there has occurred an alignment error in the optical system or not through the provided image; e) a step of, when it is determined that there has occurred an alignment error, drawing the alignment error of the optical system; and f) a step of aligning the angle of the optical unit by corresponding to the drawn alignment error. 본 발명은 홀 검사를 위한 광학계 정렬 방법 및 이에 의해 제어되는 광학계 장치에 관한 것으로, 보다 상세하게는 가공홀 검사시 광학계의 오차를 보정할 수 있는 홀 검사를 위한 광학계 정렬 방법 및 이에 의해 제어되는 광학계 장치에 관한 것이다. 상기와 같은 목적을 달성하기 위한 본 발명의 구성은 a) 광학부가 가공홀 상에 위치되는 단계; b) 상기 가공홀 상에 위치된 상기 광학부가 상기 가공홀을 촬영하는 단계; c) 상기 광학부가 상기 가공홀을 촬영하여 얻은 이미지를 분석부에 제공하는 단계; d) 상기 분석부가 제공받은 상기 이미지를 통해 상기 광학계의 정렬 오차 발생 여부를 판단하는 단계; e) 상기 정렬 오차가 발생한 것으로 판단된 경우, 상기 광학계의 정렬 오차를 도출하는 단계; 및 f) 도출된 상기 정렬 오차에 대응하여 상기 광학부의 각도가 정렬되는 단계를 포함하는 것을 특징으로 하는 홀 검사를 위한 광학계 정렬 방법을 제공한다.