RADIATION-SENSITIVE MATERIALS AND METHODS OF IMAGE FORMATION

• Format: Patent
• Language: English
• Published: 12.01.1978
• Subjects: AUXILIARY PROCESSES IN PHOTOGRAPHY; CINEMATOGRAPHY; COLOUR PRINTING; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; LINING MACHINES; PERFORMING OPERATIONS; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES; PHOTOGRAPHY; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHYSICS; PRINTING; PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; STAMPS; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS; TRANSPORTING; TYPEWRITERS

1497453 Photo-sensitive material EASTMAN KODAK CO 15 April 1975 [15 April 1974] 15497/75 Heading G2C A photo-sensitive layer comprises a cobalt III complex and a chelating compound which contains a conjugated #-bonding system and which, on exposure, forms a stable bidentate or tridentate chelate with cobalt III (through the intermediary of the cobalt II chelate, with the release of at least one ligand, e.g. ammonia). The layer contains less than 50 molar per cent of anions of acids having a pKa greater than 3À5. The complex may be free of anions. The chelating compound may be a nitrosoarol, dithioxamide, formazan, aromatic azo compound, hydrazone, or Schmitt base. Specific Examples of complexes and chelating compounds are given. A photoreductant as in Specification 1497452 and a photoactivator as in Specification 1496944 may be employed.