METHOD AND SYSTEM FOR PLASMA DIAGNOSTICS

• Main Authors: HRABOVSKÝ, Miroslav, HRUBANTOVÁ, Aneta, STRANÁK, Vítezslav, HUBICKA, Zdenek, OLEJNÍCEK, Jirí, SCHOVÁNEK, Petr, KSÍROVÁ, Petra, CTVRTLÍK, Radim, DVORÁKOVÁ, Michaela, CADA, Martin
• Format: Patent
• Language: English; French; German
• Published: 21.08.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

The subject of the invention is a method of plasma diagnostics, in which an alternating voltage is applied to a reference electrode (6) with a measurable area AAP located in a plasma discharge chamber (1) and a first set of electric current and voltage waveforms is generated at the reference electrode (6). After the completion of the measurement, the differential conductivity of the space charge sheath around the surface of the reference electrode (6) and its capacity are calculated from the measured dependences. Subsequently, an alternating voltage of the same frequency is applied to the main electrode located in the plasma and covered with a thick dielectric, and a second set of electric current and voltage waveforms is generated on the main electrode (7). From the measured values, the complex impedance of the main electrode (7) is determined and then the area of the main electrode is calculated, from which it is possible to determine other parameters such as electron temperature, voltage of the wall sheath, ion concentration and ion flux and more.