Small angle x-ray scattering measurement

• Main Authors: DIKOPORTSEV, ALEX, WORMINGTON MATTHEW, KROKHMAL ALEXANDER, WEINSTEIN, YURI
• Format: Patent
• Language: Chinese; English
• Published: 10.09.2024
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

The invention relates to small angle X-ray scattering measurement. An x-ray apparatus may include a base configured to hold a sample; an x-ray source configured to direct an x-ray beam toward a first side of the sample; a detector downstream of the second side of the sample, the detector configured to detect at least a portion of the x-rays that have been transmitted through the sample during a sample measurement period; and an x-ray intensity detector positioned at a measurement position between the x-ray source and the first side of the sample during the beam intensity monitoring period in order to detect at least a portion of the x-ray beam before the x-ray beam reaches the sample. 本申请涉及小角度X射线散射测量。一种x射线装置，该x射线装置可以包括被配置为保持样品的底座；x射线源，该x射线源被配置为将x射线束引向样品的第一侧；检测器，该检测器位于样品的第二侧的下游，该检测器被配置为在样品测量时段期间检测已经透射通过样品的x射线的至少一部分；以及x射线强度检测器，该x射线强度检测器在射束强度监控时段期间定位在位于x射线源与样品的第一侧之间的测量位置处，以便检测x射线束到达样品之前的x射线束的至少一部分。