P151Qualitative and quantitative evaluation of photoresists used in semiconductor fabrication process

• Published in: Occupational and environmental medicine (London, England) Vol. 73; no. Suppl 1; p. A171
• Main Authors: Jang, Miyeon, Park, Jihoon, Kwon, Ohhun, Yoon, Chungsik
• Format: Journal Article
• Language: English
• Published: 01.09.2016
• Subjects: Carcinogens; Information dissemination; Ingredients; Photolithography; Photoresists; Semiconductors; Solvents; Trade secrets
• ISSN: 1351-0711
• DOI: 10.1136/oemed-2016-103951.468

BackgroundThe semiconductor industry is known to use many chemicals but little is known. Especially, multi component chemicals including organic solvents and trade secret components have been used in photolithography process. The purposes of this study were to identify the chemicals used in a photolithography process and to compare it with the components in Material safety data sheets(MSDS).MethodsA total of 51 photoresists with MSDS were collected form 4 companies. The components of the chemical products were identified with MSDS and organic solvents were analysed after dilution with 1/100 of CS2and methanol respectively. Diluted samples were sonicated for 30 minutes at room temperature and viscous chemical samples were filtrated through the Nylon Syringe filter. Each 1 aliquot of the samples was injected into the GC/MS for qualitative evaluation and GC/FID for quantitative analysis. The chemical components were categorised according to its hazard indices(Carcinogen, Mutagen, Reproductive toxicant, CMR) and trade secret.ResultsForty-six products (90%) contained trade secret materials, and its amount range was 1% to 65%. A total of 237 ingredients were identified in MSDS of 51 products and 48% of ingredients was labelled as a trade secret. As the result of analysis, 26 products (51%) contained carcinogenic substance and 50% of them did not provided its toxicological information in MSDS. Also, 45% of the products contained exceptions to the trade secrets. Compare with MSDS, 40% of the products consensus within plus or minus 5% rage and 30% has over 10% deviation.ConclusionWe confirmed that several photoresists contain carcinogenic substance, and some were not recorded toxicological information in MSDS. Also, over 50% of chemical composition in photoresist through analysis was not consistent with MSDS. AS employees depend on the MSDS to obtain the information of chemical, it need provide accurate information on ingredients for their right to know.