TiO2/Ag/TiO2 박막의 전기적, 광학적, 열적 특성 및 전자파 차폐효과 연구

• Published in: 대한금속·재료학회지, 62(9) pp. 735 - 739
• Main Authors: 김지호, 김유성, 최진영, 이연학(고려아연, 공영민, 김대일
• Format: Journal Article
• Language: Korean
• Published: 대한금속·재료학회 01.09.2024
• Subjects: 재료공학
• ISSN: 1738-8228; 2288-8241
• DOI: 10.3365/KJMM.2024.62.9.735

Transparent TiO2 single layer and TiO2/Ag/TiO2(TAT) tri-layer films were deposited by DC and RFmagnetron sputter on a polyimide substrate at room temperature. During the TAT deposition, the thicknessof the TiO2 layer was kept at 20 nm, while the Ag interlayer was varied as 10, 15, 20 nm to investigate theeffect of Ag thickness on the figure of merit value which is decided by the visible transmittance and sheetresistance of the films. The compared FOM values revealed that the TiO2 films with a 15 nm thick Ag interlayerhad an ideal tri-layer structure with a higher figure of merit of 8.96×10-3 Ω-1. In a planar heater test, whenthe bias voltage of 15 V was applied to the TiO2 20 nm/Ag 15 nm/TiO2 20 nm films, their steady statetemperature increased to 108.1oC. After the heat radiation test, the films retained constantly stable optical andelectrical properties. In addition, the TAT films showed superior electromagnetic interference shieldingeffectiveness up to 45 db, which is above the specifications grade of commercial electromagnetic interferenceshielding products. From the observed experimental results, it is supposed that TAT films with an optimal Aginterlayer of 15 nm deposited on PI films can be applied as transparent electrodes for rollable display devicesand as planar heating elements, as well as electromagnetic shielding glass in future autonomous cars. KCI Citation Count: 1