RF 마그네트론 스퍼터링 법으로 제작한 ITZO 박막의 구조 및 광학적 특성

• Published in: Biuletyn Uniejowski Vol. 48; no. 6; pp. 292 - 296
• Main Authors: 김동렬(Dong Ryeol Kim), 배지환(Ji Hwan Bae), 황동현(Dong Hyun Hwang), 손영국(Young Guk Son)
• Format: Journal Article
• Language: Korean
• Published: 한국표면공학회 2015
• Subjects: 기계공학; thin film; ITZO; transmittance; RF Magnetron sputtering
• ISSN: 1225-8024; 2299-8403; 2288-8403
• DOI: 10.5695/JKISE.2015.48.6.292

Indium tin zinc oxide (ITZO) thin films were deposited on glass and quartz substrates by RF magnetron sputtering. The substrate temperature varied from $100^{\circ}C$ to $400^{\circ}C$. The structural and optical properties of thin films were investigated by X-ray diffraction (XRD), Field Emission Scanning electron microscopy (FESEM) and UV-Visible transmission spectra. It has been found from X-ray diffraction patterns that increasing the substrate temperature, the amorphous structure changes into polycrystalline structure. The FESEM results showed that all ITZO thin films have a smooth surface. The average optical transmittance (400 - 800 nm) was 82% and 80% at all films deposited at $200^{\circ}C$. The band gap energy ranges 3.41 to 3.57eV and 2.81 to 3.44eV with a maximum value at $200^{\circ}C$ all substrates temperature.