노즐 분사 방식의 ITO 표면 포토레지스트 박리과정 요인의 수치해석

• Published in: 한국생산제조학회지 Vol. 26; no. 2; pp. 158 - 165
• Main Authors: 김준현(Joon Hyun Kim), 이준혁(Joon Hyuck Lee), 강태성(Tae Seong Kang), 주기태(Gi-Tae Joo), 김용성(Young Sung Kim), 정병현(Byung Hyun Jeong), 이대원(Dae Won Lee)
• Format: Journal Article
• Language: Korean
• Published: 한국생산제조학회 2017
• Subjects: 기계공학; Aqueous stripper; Agitation; Stripping process; Spray; ITO; Photoresist
• ISSN: 2508-5093; 2508-5107
• DOI: 10.7735/ksmte.2017.26.2.158

This study investigated spraying factors applicable to stripper usage. Cyclodextrine, as environment-friendly material, was included in the stripper composition. An efficient spray technology was applied for the Photoresist strip. For industrial applications, stripping requires a temperature below $50^{\circ}C$, a strip time within 50 s, and chemically stable activation. Spraying factors were organized considering many conditions-orifice diameter, working pressure (inlet speed), spray distance, and spray angle. For commercial practicability, the flow rate was limited to 3 L/min. The nozzle parameters were nozzle orifice diameter of 1.8-2.2 mm, spray distance of 40-60 mm, and injection speed of 0.7-1.2 m/s. Through the thermal spray movement of the fluid, the thermal boundary layer for a chemical reaction just above the ITO-glass surface and momentum region for sufficient agitation (above 4 m/s) was achieved.