불소수지의 무전해 동도금을 위한 단계적 플라즈마 전처리법에 관한 연구

Low temperature plasma treatment with different gases and rf powers were performed to improve the adhesion strength between polytetrafluoroethylene(PTFE) and electroless deposited copper. According to the research, $H_2$ plasma having hydrogen radical was more effective in surface polarity modificat...

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Published inBiuletyn Uniejowski Vol. 38; no. 3; pp. 118 - 125
Main Authors 신승한(Seunghan Shin), 한성호(Sung Ho Han), 김영석(Young Seok Kim)
Format Journal Article
LanguageKorean
Published 한국표면공학회 2005
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ISSN1225-8024
2299-8403
2288-8403

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Abstract Low temperature plasma treatment with different gases and rf powers were performed to improve the adhesion strength between polytetrafluoroethylene(PTFE) and electroless deposited copper. According to the research, $H_2$ plasma having hydrogen radical was more effective in surface polarity modification than $O_2$ plasma due to the defluorination reaction. However, surface roughness of PTFE was more increased with $O_2$ than $H_2$ plasma. PTFE treated with $120W-O_2$ plasma and $250w-H_2$ plasma, consecutively showed rougher surface than single step $250w-H_2$ plasma treated one and more hydrophilic than single step $120W-O_2$ plasma treated one. And it showed 5B tape test grade, which is better adhesion property than 1B or 3B obtained by single step plasma treatment. In addition, adhesion strength between PTFE and Cu deposit is also deeply affected by residual water on its interface.
AbstractList Low temperature plasma treatment with different gases and rf powers were performed to improve the adhesion strength between polytetrafluoroethylene(PTFE) and electroless deposited copper. According to the research, $H_2$ plasma having hydrogen radical was more effective in surface polarity modification than $O_2$ plasma due to the defluorination reaction. However, surface roughness of PTFE was more increased with $O_2$ than $H_2$ plasma. PTFE treated with $120W-O_2$ plasma and $250w-H_2$ plasma, consecutively showed rougher surface than single step $250w-H_2$ plasma treated one and more hydrophilic than single step $120W-O_2$ plasma treated one. And it showed 5B tape test grade, which is better adhesion property than 1B or 3B obtained by single step plasma treatment. In addition, adhesion strength between PTFE and Cu deposit is also deeply affected by residual water on its interface.
Low temperature plasma treatment with different gases and rf powers were performed to improve the adhesion strength between polytetrafluoroethylene(PTFE) and electroless deposited copper. According to the research, H2 plasma having hydrogen radical was more effective in surface polarity modification than O2 plasma due to the defluorination reaction. However, surface roughness of PTFE was more increased with O2 than H2 plasma. PTFE treated with 120W-O2 plasma and 250W-H2 plasma, consecutively showed rougher surface than single step 250W-H2 plasma treated one and more hydrophilic than single step 120W-O2 plasma treated one. And it showed 5B tape test grade, which is better adhesion property than 1B or 3B obtained by single step plasma treatment. In addition, adhesion strength between PTFE and Cu deposit is also deeply affected by residual water on its interface. KCI Citation Count: 0
Author 신승한(Seunghan Shin)
김영석(Young Seok Kim)
한성호(Sung Ho Han)
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Surface polarity
2-step treatment
PTFE
Surface roughness
Low temperature plasma
Adhesion
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Title 불소수지의 무전해 동도금을 위한 단계적 플라즈마 전처리법에 관한 연구
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