次世代メートルサイズ大面積プロセス用プラズマ源

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Published inプラズマ・核融合学会誌 Vol. 81; no. 2; pp. 85 - 93
Main Author 節原, 裕一
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LanguageJapanese
Published 社団法人 プラズマ・核融合学会 2005
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ISSN0918-7928
DOI10.1585/jspf.81.85

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Author 節原, 裕一
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References_xml – reference: [45] J. Perrin, J. Schmitt, C. Hollenstein, A. Howling and L. Sansonnens, Plasma Phys. Control. Fusion 42. B353 (2000).
– reference: [49] M.H. Khater and L.J. Overzet, Plasma Sources Sci. Technol. 9, 545 (2000).
– reference: [9] B.P. Wood, I. Henins, R.J. Gribble, W.A. Reass, R.J. Faehl, M. A. Nastasi and D. J. Rej, J. Vac. Sci. Technol. B12, 870(1994).
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– reference: [5] A.A. Howling, J.L. Dorier, C. Hollenstein and U. Kroll, J. Vac. Sci. Technol. A 10, 1080 (1992).
– reference: [34] M. Moisan, A. Shivarova and A.W. Trivelpiece, Plasma Phys. 24, 1331 (1982).
– reference: [56] G. Hwang and K. Giapis, J. Appl. Phys. 81, 3433 (1997).
– reference: [12] M. Meyyappan and M.J. Colgan, J. Vac. Sci. Technol. A 14, 2790 (1996).
– reference: [25] U. Kortshagen, N.D. Gibson and J.E. Lawler, J. Phys. D: Appl. Phys. 29, 1224 (1996).
– reference: [37] E. Bluem, S. Bechu, C. Boisse-Laporte, P. Leprince and J. Marec, J. Phys. D: Appl. Phys. 28, 1529 (1995).
– reference: [55] V. Godyak and V. Kolobov, Phys. Plasmas 81, 369 (1998).
– reference: [40] I. Odrobina, J. Kudera and M. Kando, Plasma Sources Sci. Technol. 7, 238 (1998).
– reference: [46] K. Ono, J. Plasma Fusion Res. 80, 909 (2004).
– reference: [63] Y. Setsuhara, T. Shoji, A. Ebe, S. Baba, N. Yamamoto, K. Takahashi, K. Ono and S. Miyake, Surf. Coat. Technol. 174-175, 33 (2003).
– reference: [16] T. Kitajima, Y. Takeo and T. Makabe, J. Vac. Sci. Technol. A17, 2510 (1999).
– reference: [2] A. Bogaerts, E. Neyts, R. Gijbels and J. van der Mullen, Spectrochimica Acta B 57, 609 (2002 ).
– reference: [61] A. Wendt and L. Mahoney, Pure Appl. Chem. 68, 1055 (1996).
– reference: [20] P.L.G. Ventzek, R.J. Hoekstra and M.J. Kushner, J. Vac. Sci. Technol. 12, 461 (1994).
– reference: [32] Y. Setsuhara, S. Miyake, Y. Sakawa and T. Shoji, Surf. Coat. Technol. 136, 60 (2001).
– reference: [64] S. Sugiura, Y. Setsuhara, K. Takahashi and K. Ono, Proc. 21st Symposium on Plasma Processing, Sapporo, 28-30 Jan. 2004, ed. K. Ono (Kyoto, Japan Society of Applied Physics, 2004) p.334.
– reference: [23] R.A. Stewart, P. Vitello and D.B. Graves, J. Vac. Sci. Technol. B 12, 478 (1994).
– reference: [22] L.J. Mahoney, A.E. Wendt, E. Barrios, C.J. Richards and J.L. Shohet, J. Appl. Phys. 76, 2041 (1994).
– reference: [29] Y. Setsuhara, S. Miyake, Y. Sakawa and T. Shoji, Jpn. J. Appl. Phys. 38, 4263 (1999).
– reference: [26] M.A. Sobolewski, Phys. Rev. E 56, 1001 (1997).
– reference: [27] I.M. El-Fayoumi and I.R. Jones, Plasma Sources Sci. Technol. 6, 201 (1997).
– reference: [1] M.A. Lieberman and A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
– reference: [58] 竹谷元伸:公開特許公報 特開平9-270299.
– reference: [48] Y. Wu and M. A. Lieberman, Plasma Sources Sci. Technol. 9, 210 (2000).
– reference: [21] J. Hopwood, Plasma Sources Sci. Technol. 3, 460 (1994).
– reference: [52] A. Lamm, J. Vac. Sci. Technol. A 15, 2615 (1997).
– reference: [3] 北原洋明:’04 最新液晶プロセス技術(プレスジャーナル, 2004)p.23.
– reference: [7] A.A. Howling, J.L. Dorier, C. Hollenstein, U. Kroll and F. Finger, J. Vac. Sci. Technol. A 10, 1080 (1992).
– reference: [43] M. Nagatsu, S. Morita, I. Ghanashev, A. Ito, N. Toyoda and H. Sugai, J. Phys. D: Appl. Phys. 33, 1143 (2000).
– reference: [36] F. Werner, D. Korzec and J. Engemann, Plasma Sources Sci. Technol. 3, 473 (1994).
– reference: [13] W. Tsai, G. Mueller , R. Lindquist, B. Frazier and V. Vahedi, J. Vac. Sci. Technol. B 14, 3276 (1996).
– reference: [17] T. Kitajima, Y. Takeo, Z.L. Petrovic and T. Makabe, Appl. Phys. Lett. 77, 489 (2000).
– reference: [35] K. Komachi and S. Kobayashi, J. Microwave Power Electromagn. Energy 24, 140 (1989).
– reference: [33] M. Moisan, C. Baudry and P. Leprince, IEEE Trans. Plasma Sci. PS-3, 1004 (1975).
– reference: [38] T. Kimura, Y. Yoshida and S. Mizuguchi, Jpn. J. Appl. Phys. 34, L1076 (1995).
– reference: [14] L. Sansonnens, A. Pletzer, D. Magni, A.A. Howling, C. Hollenstein and J.P.M. Schmitt, Plasma Sources Sci. Technol. 6, 170 (1997).
– reference: [60] 金田一要三:公開特許公報 特開平8-236294.
– reference: [15] G.J. Nienhuis and W. Goedheer, Plasma Sources Sci. Technol. 8, 295 (1999).
– reference: [59] 篠原己抜:公開特許公報 特開2001-321662.
– reference: [6] H.H. Goto, H.D. Lowe and T. Ohmi, J. Vac. Sci. Technol. A 10, 3048 (1992).
– reference: [62] Y. Wu and M.A. Lieberman, Appl. Phys. Lett. 72, 777 (1998).
– reference: [31] S.-H. Seo, C.W. Chung and H.-Y. Chang, Surf. Coat. Technol. 131, 1 (2000).
– reference: [10] K.K. Kalpakjian, M.A. Lieberman and W.G. Oldham, J. Vac. Sci. Technol. B 12, 1351 (1994).
– reference: [50] E. Jaeger, L. Berry, J. Tolliver and D. Batchelor, Phys. Plasmas 2, 2597 (1995).
– reference: [57] Y. Takeuchi, M. Murata, S. Uchino and Y. Kawai, Jpn. J. Appl. Phys. 40, 3405 (2001).
– reference: [39] M. Nagatsu, G. Xu, M. Yamage, M. Kanoh and H. Sugai, Jpn. J. Appl. Phys. 35, L341 (1996).
– reference: [44] I. Ganachev and H. Sugai, Surf. Coatings Technol. 174-175, 15 (2003).
– reference: [42] F.M. Dias, E. Tatarova and C.M. Ferreira, J. Appl. Phys. 83, 4602 (1998).
– reference: [53] J.P.M. Schmitt, Thin Solid Films 174, 193 (1989).
– reference: [24] T. Okumura andI. Nakayama, Rev. Sci. Instrum. 66, 5262 (1995).
– reference: [4] 菅井秀郎:応用物理 70, 398 (2001).
– reference: [54] M.A. Lieberman, J.P. Booth, P. Chabert, J.M. Rax and M.M. Turner, Plasma Sources Sci. Technol. 11, 283 (2002).
– reference: [51] M. Kushner, W. Collison, M. Grapperhaus, J. Holland and M. Barnes, J. Appl. Phys. 80, 1337 (1996).
– reference: [8] V. Vahedi, C.K. Birdsall, M.A. Lieberman, G. DiPeso and T.D. Rognlien, Phys. Fluids B 5, 2719 (1993).
– reference: [11] M.J. Colgan, M. Meyyappan and D.E. Murnick, Plasma Sources Sci. Technol. 3, 181 (1994).
– reference: [28] J.T. Gudmundsson and M.A. Lieberman, Plasma Sources Sci. Technol. 7, 1 (1998).
– reference: [30] S. Miyake, Y. Setsuhara, Y. Sakawa and T. Shoji, Vacuum 59, 472 (2000).
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