Digital Illumination in Microscale Direct-Writing Photolithography: Challenges and Trade-Offs

We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object...

Full description

Saved in:
Bibliographic Details
Published in2018 IEEE British and Irish Conference on Optics and Photonics (BICOP) pp. 1 - 4
Main Authors Stonehouse, Mark, Zhang, Yanchao, Guilhabert, Benoit, Watson, Ian, Gu, Erdan, Herrnsdorf, Johannes, Dawson, Martin
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.12.2018
Subjects
Density measurement
Lenses
Light emitting diodes
Lighting
Lithography
Photonics
Power system measurements
Online AccessGet full text
DOI10.1109/BICOP.2018.8658364

Cover

More Information
Summary:We explore the adaptation of existing photolithography technologies and introduce the potential for additional functionality in the form of structured light. By using a complementary metal oxide semiconductor (CMOS) controlled micropixellated light emitting diode (LED) array, features such as object recognition, tracking and characterization are possible in combination with photo-curing. We discuss the observed trade off between the delivered power density and resolution capability of the system due to the requirements of the additional features.
DOI:10.1109/BICOP.2018.8658364