Low-Frequency Noise Measurements for Electromigration Characterization in BEOL Interconnects

In this paper we discuss a new EM test methodology, based on low-frequency noise (LFN) measurements. The main advantages of LFN over the standard accelerated EM tests are that they are non-destructive, much faster, closer to operation conditions and provide more fundamental understanding. Using the...

Full description

Saved in:
Bibliographic Details
Published inIEEE International Integrated Reliability Workshop final report pp. 1 - 9
Main Authors Beyne, S., Croes, K., Pedreira, O. Varela, Arnoldi, L., van der Veen, M. H., De Wolf, I., Tokei, Zs
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.10.2019
Subjects
BEOL reliability
cobalt
Conferences
Electromigration
Energy measurement
interconnects
Life estimation
Low frequency noise
Metallization
Noise measurement
Reliability
Ruthenium
Online AccessGet full text
ISSN2374-8036
DOI10.1109/IIRW47491.2019.8989897

Cover

More Information
Summary:In this paper we discuss a new EM test methodology, based on low-frequency noise (LFN) measurements. The main advantages of LFN over the standard accelerated EM tests are that they are non-destructive, much faster, closer to operation conditions and provide more fundamental understanding. Using the LFN technique, we study the EM properties in sub-30 nm line-width Cu interconnects with various metallization schemes. Furthermore, the EM activation energies of alternative metal interconnects (Ru, Co, W) are studied by means of LFN measurements.
ISSN:2374-8036
DOI:10.1109/IIRW47491.2019.8989897