APA (7th ed.) Citation

Kim, Y. S., Lim, K., Sung, M., Kim, S., Yang, H., Cho, H., . . . Kim, J. (2007, September). Low resistive tungsten dual polymetal gate process for high speed and high density memory devices. ESSDERC 2007 - 37th European Solid State Device Research Conference, 259-262. https://doi.org/10.1109/ESSDERC.2007.4430927

Chicago Style (17th ed.) Citation

Kim, Yong Soo, et al. "Low Resistive Tungsten Dual Polymetal Gate Process for High Speed and High Density Memory Devices." ESSDERC 2007 - 37th European Solid State Device Research Conference Sep. 2007: 259-262. https://doi.org/10.1109/ESSDERC.2007.4430927.

MLA (9th ed.) Citation

Kim, Yong Soo, et al. "Low Resistive Tungsten Dual Polymetal Gate Process for High Speed and High Density Memory Devices." ESSDERC 2007 - 37th European Solid State Device Research Conference, Sep. 2007, pp. 259-262, https://doi.org/10.1109/ESSDERC.2007.4430927.