Electron-beam-patterning simulation and metrology of complex layouts on Si/Mo multilayer substrates

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Bibliographic Details
Published inProceedings of SPIE, the international society for optical engineering
Format Conference Proceeding
LanguageEnglish
Published 01.01.2008
Online AccessGet full text
ISSN1996-756X
0277-786X
DOI10.1117/12.769392

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ISSN:1996-756X
0277-786X
DOI:10.1117/12.769392