A Simulation Approach to Semiconductor Scheduling Problem in Micro-Lithographic Process

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Bibliographic Details
Published inInternational Journal of New Practices in Management and Engineering
Format Journal Article
LanguageEnglish
Online AccessGet full text
ISSN2250-0839
DOI10.17762/ijnpme.v11i1s.138

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ISSN:2250-0839
DOI:10.17762/ijnpme.v11i1s.138