Kinetic process of nitridation on the a-sapphire surface
We established a model to simulate the growth process of nitridation and clarified the inner mechanisms ofnitridation and over-nitridation by combining the kinetic Monte Carlo and molecular dynamics methods. Supported by reflection high-energy electron diffraction results with growth in an MBE syste...
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| Published in | Journal of semiconductors Vol. 35; no. 11; pp. 184 - 187 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
01.11.2014
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1674-4926 |
| DOI | 10.1088/1674-4926/35/11/116004 |
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| Summary: | We established a model to simulate the growth process of nitridation and clarified the inner mechanisms ofnitridation and over-nitridation by combining the kinetic Monte Carlo and molecular dynamics methods. Supported by reflection high-energy electron diffraction results with growth in an MBE system, the tendency of nitridation on s-sapphire in different conditions was observed and analyzed. The best conditions for nitridation on the a-sapphire surface are found by our simulation. |
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| Bibliography: | Tang Xingzhou, Li Shuping, Kang Junyong, Chen Jiaqi(1 Department of Physics, Xiamen University, Xiamen 361005, China 2Key Laboratory of Semiconductor Materials and Application of Fujian Province, Xiamen 361005, China) nitridation; kinetic Monte Carlo (KMC); molecular dynamics (MD); molecular beam epitaxy (MBE);reflection high-energy electron diffraction (RHEED) 11-5781/TN We established a model to simulate the growth process of nitridation and clarified the inner mechanisms ofnitridation and over-nitridation by combining the kinetic Monte Carlo and molecular dynamics methods. Supported by reflection high-energy electron diffraction results with growth in an MBE system, the tendency of nitridation on s-sapphire in different conditions was observed and analyzed. The best conditions for nitridation on the a-sapphire surface are found by our simulation. ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
| ISSN: | 1674-4926 |
| DOI: | 10.1088/1674-4926/35/11/116004 |