Kinetic process of nitridation on the a-sapphire surface

We established a model to simulate the growth process of nitridation and clarified the inner mechanisms ofnitridation and over-nitridation by combining the kinetic Monte Carlo and molecular dynamics methods. Supported by reflection high-energy electron diffraction results with growth in an MBE syste...

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Published inJournal of semiconductors Vol. 35; no. 11; pp. 184 - 187
Main Author 汤星舟 李书平 康俊勇 陈佳琪
Format Journal Article
LanguageEnglish
Published 01.11.2014
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ISSN1674-4926
DOI10.1088/1674-4926/35/11/116004

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Summary:We established a model to simulate the growth process of nitridation and clarified the inner mechanisms ofnitridation and over-nitridation by combining the kinetic Monte Carlo and molecular dynamics methods. Supported by reflection high-energy electron diffraction results with growth in an MBE system, the tendency of nitridation on s-sapphire in different conditions was observed and analyzed. The best conditions for nitridation on the a-sapphire surface are found by our simulation.
Bibliography:Tang Xingzhou, Li Shuping, Kang Junyong, Chen Jiaqi(1 Department of Physics, Xiamen University, Xiamen 361005, China 2Key Laboratory of Semiconductor Materials and Application of Fujian Province, Xiamen 361005, China)
nitridation; kinetic Monte Carlo (KMC); molecular dynamics (MD); molecular beam epitaxy (MBE);reflection high-energy electron diffraction (RHEED)
11-5781/TN
We established a model to simulate the growth process of nitridation and clarified the inner mechanisms ofnitridation and over-nitridation by combining the kinetic Monte Carlo and molecular dynamics methods. Supported by reflection high-energy electron diffraction results with growth in an MBE system, the tendency of nitridation on s-sapphire in different conditions was observed and analyzed. The best conditions for nitridation on the a-sapphire surface are found by our simulation.
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ISSN:1674-4926
DOI:10.1088/1674-4926/35/11/116004