电沉积法制备加速器生产^64Cu的镍靶

为制备加速器生产^64 Cu辐照用Ni靶,采用电沉积法研究了电沉积过程中影响Ni靶层质量和质量厚度的主要因素,确定了Ni靶制备工艺条件和参数,为Ni浓度40～50g/L,盐酸浓度0.05～0.5mol/L,电沉积温度20～50℃,搅拌器旋转速度150～350r/min,电流密度10～35mA/cm^2。在此工艺条件下制备出的Ni靶件表面光滑、平整,靶层致密、牢固,可应用于回旋加速器生产^64 Cu。...

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Bibliographic Details
Published in同位素 Vol. 26; no. 1; pp. 38 - 41
Main Author 沈亦佳 陈玉清 梁积新 乔来成 邓雪松 李光 刘玉平
Format Journal Article
LanguageChinese
Published 原子高科股份有限公司,北京,102413 2013
Subjects
64Cu
Ni靶
加速器
电沉积法
64Cu
Ni靶
电沉积法
加速器
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ISSN1000-7512
DOI10.7538/tws.2013.26.01.0038

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Summary:为制备加速器生产^64 Cu辐照用Ni靶,采用电沉积法研究了电沉积过程中影响Ni靶层质量和质量厚度的主要因素,确定了Ni靶制备工艺条件和参数,为Ni浓度40～50g/L,盐酸浓度0.05～0.5mol/L,电沉积温度20～50℃,搅拌器旋转速度150～350r/min,电流密度10～35mA/cm^2。在此工艺条件下制备出的Ni靶件表面光滑、平整,靶层致密、牢固,可应用于回旋加速器生产^64 Cu。
Bibliography:11-2566/TL
64Cu; Ni target; electrodeposition; cyclotron
SHEN Yi-jia,CHEN Yu-qing,LIANG Ji-xin,QIAO Lai-cheng,DENG Xue-song, LI Guang,LIU Yu-ping（HTA CO.,LTD.,Beijing 102413,China）
To prepare Ni target with high quality for producing 64Cu using cyclotron,the target preparation process by electro-deposition method was studied.The effects of main process parameters on the performance and mass thickness of Ni target were studied.Under the optimum conditions,namely 40-50 g/L of Ni2＋ concentration,0.05-0.5 mol/L of HCl concentration,10-35 mA/cm2 of current density,rotation rate of 150-350 r/min,at 20-50 ℃,a high quality（good uniformity and adherence） Ni target could be made successfully.
ISSN:1000-7512
DOI:10.7538/tws.2013.26.01.0038