Block Copolymer Orientation Control Using a Top-Coat Surface Treatment

Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patte...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 25; no. 1; pp. 125 - 130
Main Authors Cushen, Julia D., Maher, Michael J., Willson, C. Grant, Seshimo, Takehiro, Durand, William J., Ellison, Christopher J., Dean, Leon M., Bates, Christopher M.
Format Journal Article
LanguageEnglish
Published The Society of Photopolymer Science and Technology(SPST) 01.01.2012
Subjects
Alignment
Block copolymers
Blocking
directed self assembly
High resolution
Patterning
Self assembly
Si-containing block copolymer
Surface energy
Surface treatment
Top-coat
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ISSN0914-9244
1349-6336
DOI10.2494/photopolymer.25.125

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Summary:Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patterns by thermal annealing of BCPs with a lower surface energy block, which tends to align with the air interface. New top surface treatment materials that provide a surface energy between those of the blocks have been developed that enable perpendicular pattern alignment with block copolymers that have a low surface energy block.
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.25.125