Outcome in patient-specific PEEK cranioplasty: A two-center cohort study of 40 implants

The best material choice for cranioplasty following craniectomy remains a subject to discussion. Complication rates after cranioplasty tend to be high. Computer-assisted 3-dimensional modelling of polyetheretherketone (PEEK) was recently introduced for cranial reconstruction. The aim of this study w...

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Published inJournal of cranio-maxillo-facial surgery Vol. 44; no. 9; pp. 1266 - 1272
Main Authors Jonkergouw, J., van de Vijfeijken, S.E.C.M., Nout, E., Theys, T., Van de Casteele, E., Folkersma, H., Depauw, P.R.A.M., Becking, A.G.
Format Journal Article
LanguageEnglish
Published Scotland Elsevier Ltd 01.09.2016
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ISSN1010-5182
1878-4119
1878-4119
DOI10.1016/j.jcms.2016.07.005

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Summary:The best material choice for cranioplasty following craniectomy remains a subject to discussion. Complication rates after cranioplasty tend to be high. Computer-assisted 3-dimensional modelling of polyetheretherketone (PEEK) was recently introduced for cranial reconstruction. The aim of this study was to evaluate patient- and surgery-related characteristics and risk factors that predispose patients to cranioplasty complications. This retrospective study included a total of 40 cranial PEEK implants in 38 patients, performed at two reference centers in the Netherlands from 2011 to 2014. Complications were registered and patient- and surgery-related data were carefully analysed. The overall complication rate of PEEK cranioplasty was 28%. Complications included infection (13 %), postoperative haematoma (10 %), cerebrospinal fluid leak (2.5 %) and wound-related problems (2.5 %). All postoperative infections required removal of the implant. Nonetheless removed implants could be successfully re-used after re-sterilization. Although overall complication rates after PEEK cranioplasty remain high, outcomes are satisfactory, as our results compare favourably to recent literature reports on cranial vault reconstruction.
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ISSN:1010-5182
1878-4119
1878-4119
DOI:10.1016/j.jcms.2016.07.005