Majkowycz, K., Murawski, K., Kopytko, M., Nowakowski-Szkudlarek, K., Witkowska-Baran, M., & Martyniuk, P. (2024). The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials. Nanomaterials (Basel, Switzerland), 14(19), 1612. https://doi.org/10.3390/nano14191612
Chicago Style (17th ed.) CitationMajkowycz, Kinga, Krzysztof Murawski, Małgorzata Kopytko, Krzesimir Nowakowski-Szkudlarek, Marta Witkowska-Baran, and Piotr Martyniuk. "The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials." Nanomaterials (Basel, Switzerland) 14, no. 19 (2024): 1612. https://doi.org/10.3390/nano14191612.
MLA (9th ed.) CitationMajkowycz, Kinga, et al. "The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials." Nanomaterials (Basel, Switzerland), vol. 14, no. 19, 2024, p. 1612, https://doi.org/10.3390/nano14191612.