Morita, M., Yamashita, T., & Yamamoto, I. (2012). Novel Fluorinated Polymers for Releasing Material in Nanoimprint Lithography. Journal of Photopolymer Science and Technology, 25(2), 207-210. https://doi.org/10.2494/photopolymer.25.207
Chicago Style (17th ed.) CitationMorita, Masamichi, Tsuneo Yamashita, and Ikuo Yamamoto. "Novel Fluorinated Polymers for Releasing Material in Nanoimprint Lithography." Journal of Photopolymer Science and Technology 25, no. 2 (2012): 207-210. https://doi.org/10.2494/photopolymer.25.207.
MLA (9th ed.) CitationMorita, Masamichi, et al. "Novel Fluorinated Polymers for Releasing Material in Nanoimprint Lithography." Journal of Photopolymer Science and Technology, vol. 25, no. 2, 2012, pp. 207-210, https://doi.org/10.2494/photopolymer.25.207.