Novel Fluorinated Polymers for Releasing Material in Nanoimprint Lithography

In recent years, utilization and reduction of pattern size are following nanoimprint lithography (NIL) quickly. Since nanoimprint is mainly contact printing, a higher separation force causes damages in the master mold and imprinting tool, and degradation in pattern quality as well. There is a mold-r...

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Bibliographic Details
Published inJournal of Photopolymer Science and Technology Vol. 25; no. 2; pp. 207 - 210
Main Authors Morita, Masamichi, Yamashita, Tsuneo, Yamamoto, Ikuo
Format Journal Article
LanguageEnglish
Published The Society of Photopolymer Science and Technology(SPST) 01.01.2012
Subjects
Contact angle
Fluorination
Fluorine lyophobic resist
Fluoroalkyl acrylate copolymer
Fluoropolymers
Lithography
Molds
Nanocomposites
Nanoimprint
Nanomaterials
Nanostructure
Perfluoroporyether
Releasing material
Resist
Utilization
UV-NIL
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ISSN0914-9244
1349-6336
DOI10.2494/photopolymer.25.207

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Summary:In recent years, utilization and reduction of pattern size are following nanoimprint lithography (NIL) quickly. Since nanoimprint is mainly contact printing, a higher separation force causes damages in the master mold and imprinting tool, and degradation in pattern quality as well. There is a mold-release characteristic of a master mold and mold materials as one of the biggest subjects in utilization. Then, we focused on release materials, and the new fluorinated polymers, based on α-chloroacrylate added to mold materials, were developed. In this paper, we report these synthesis methods, specific properties such as static contact angle as well as the segregation of fluorinated polymers on resin surfaces.
Bibliography:ObjectType-Article-2
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.25.207