Enhanced non-classical electrostriction in strained tetragonal ceria
Electrostriction is the upsurge of strain under an electric field in any dielectric material. Oxygen-defective metal oxides, such as acceptor-doped ceria, exhibit high electrostriction 10 -17 m 2 V -2 values, which can be further enhanced via interface engineering at the nanoscale. This effect in ce...
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Published in | Nature communications Vol. 16; no. 1; pp. 36 - 11 |
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Main Authors | , , , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
London
Nature Publishing Group UK
02.01.2025
Nature Publishing Group Nature Portfolio |
Subjects | |
Online Access | Get full text |
ISSN | 2041-1723 2041-1723 |
DOI | 10.1038/s41467-024-55393-6 |
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Summary: | Electrostriction is the upsurge of strain under an electric field in any dielectric material. Oxygen-defective metal oxides, such as acceptor-doped ceria, exhibit high electrostriction 10
-17
m
2
V
-2
values, which can be further enhanced via interface engineering at the nanoscale. This effect in ceria is “non-classical” as it arises from an intricate relation between defect-induced polarisation and local elastic distortion in the lattice. Here, we investigate the impact of mismatch strain when epitaxial Gd-doped CeO
2
thin films are grown on various single-crystal substrates. We demonstrate that varying the compressive and tensile strain can fine-tune the electromechanical response. The electrostriction coefficients achieve a large
M
11
≈ 3.6·10
-15
m
2
V
-2
in lattices of in-plane compressed films, i.e., a positive tetragonality (
c/a
-1 > 0), with stress above 3 GPa at the film/substrate interface. Chemical and structural analysis suggests that the high electrostriction stems from anisotropic distortions in the local lattice strain, which lead to constructively oriented elastic dipoles and Ce
3+
electronic defects.
Non-classical electrostriction in fluorites arises from defect-induced polarization and lattice distortions. This study shows that mismatch strain in Gd-doped CeO
2
thin films fine-tunes electromechanical responses, achieving high electrostriction above 10−
15
m
2
V
−2
. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 14 content type line 23 |
ISSN: | 2041-1723 2041-1723 |
DOI: | 10.1038/s41467-024-55393-6 |