dGTP-dependent processivity and possible template switching of Euplotes telomerase

We have measured the processivity of telomeric DNA extension by Euplotes aediculatus telomerase at various concentrations of the nucleotide substrates dGTP and dTTP. The maximum processivity (∼3 repeats) was observed at ∼100 µM of each dNTP. Processivity decreased as the dNTP concentrations were red...

Full description

Saved in:
Bibliographic Details
Published inNucleic acids research Vol. 25; no. 18; pp. 3698 - 3704
Main Authors Hammond, Philip W., Cech, Thomas R.
Format Journal Article
LanguageEnglish
Published England Oxford University Press 15.09.1997
Subjects
Online AccessGet full text
ISSN0305-1048
1362-4962
DOI10.1093/nar/25.18.3698

Cover

More Information
Summary:We have measured the processivity of telomeric DNA extension by Euplotes aediculatus telomerase at various concentrations of the nucleotide substrates dGTP and dTTP. The maximum processivity (∼3 repeats) was observed at ∼100 µM of each dNTP. Processivity decreased as the dNTP concentrations were reduced and, surprisingly, as the concentration of dGTP was increased. Also, the characteristic banding pattern generated by telomerase extension of DNA primers shifted in response to changes in dGTP concentration. One pattern with 8 nt periodicity was predominant at dGTP concentrations ≤16 µM, while at ≥250 µM an 8 nt repeat pattern out-of-phase with the first was observed; at intermediate concentrations the two patterns coexisted. We propose that two different segments of the RNA subunit can serve as the template for repeat synthesis; nt 42–49 at low dGTP concentrations and nt 36–43 at high dGTP concentrations. An alternative model for the low dGTP pattern involves an internal pause site but no pause at the end of the template and is, therefore, considered less likely. Because the effects of dGTP on processivity and banding pattern appear to be distinct from nucleotide binding in the polymerase active site, we propose a second dGTP binding site involved in template selection and processivity.
Bibliography:istex:E2ECAAEF6C84F683758BF0C219AB944E778DB2EB
Present address: Mosaic Technologies, Inc., 1106 Commonwealth Avenue, Boston, MA 02215, USA
ark:/67375/HXZ-C6GT06CV-L
ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ObjectType-Article-1
ObjectType-Feature-2
ISSN:0305-1048
1362-4962
DOI:10.1093/nar/25.18.3698