Growth of bulk GaN crystal by Na flux method under various conditions

High-quality and low cost bulk crystals are needed in the field of group III nitride semiconductors in order to develop optical and electrical devices. There are two approaches for the growth of bulk GaN crystal by the Na flux method. One is to grow thick GaN crystal on a large seed GaN crystal grow...

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Published inJournal of crystal growth Vol. 350; no. 1; pp. 72 - 74
Main Authors Mori, Y., Imade, M., Murakami, K., Takazawa, H., Imabayashi, H., Todoroki, Y., Kitamoto, K., Maruyama, M., Yoshimura, M., Kitaoka, Y., Sasaki, T.
Format Journal Article Conference Proceeding
LanguageEnglish
Published Amsterdam Elsevier B.V 01.07.2012
Elsevier
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ISSN0022-0248
1873-5002
DOI10.1016/j.jcrysgro.2011.12.026

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Summary:High-quality and low cost bulk crystals are needed in the field of group III nitride semiconductors in order to develop optical and electrical devices. There are two approaches for the growth of bulk GaN crystal by the Na flux method. One is to grow thick GaN crystal on a large seed GaN crystal grown by vapor phase method. The other is to grow GaN crystal on a small seed GaN crystal. 3in diameter GaN crystals were grown on the large GaN seed crystal. In the case of the growth on a small GaN seed, we obtained bulk crystal with a pyramidal shape and its height and diameter were 15mm and >20mm, respectively. We also present the effects of the impurity in the solution on the property and growth habit.
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ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2011.12.026