Toward the β-FeSi2 p-n homo-junction structure

• Published in: Thin solid films Vol. 515; no. 22; pp. 8210 - 8215
• Main Authors: Momose, N., Shirai, J., Tahara, H., Todoroki, Y., Hara, T., Hashimoto, Y.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Lausanne Elsevier Science 15.08.2007
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physical properties of thin films, nonelectronic; Physics; Structure and morphology; thickness; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thermal stability; thermal effects; Thin film structure and morphology; Crystal growth; Thermal diffusion; Glass; MoSi2; Phosphorus additions; Molybdenum silicides; Thin films; Softening temperature; Glass substrate; p n junctions; Aluminium additions; Thermal expansion coefficient; β-FeSi2; Nitrogen additions; Nickel; Vacuum evaporation; Iron silicides
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2007.02.037