Continuous Flow Supercritical Chemical Fluid Deposition of Optoelectronic Quality CdS

Supercritical chemical fluid deposition (SCFD) has been shown to have remarkable advantages for deposition inside nanostructured templates however so far the technique has mostly been used to deposit metals. In this paper we present the SCFD of optoelectronic grade CdS. The quality of this material...

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Published inAdvanced materials (Weinheim) Vol. 21; no. 41; pp. 4115 - 4119
Main Authors Yang, Jixin, Hyde, Jason R., Wilson, James W., Mallik, Kanad, Sazio, Pier J., O'Brien, Paul, Malik, Mohamed A., Afzaal, Mohammad, Nguyen, Chinh Q., George, Michael W., Howdle, Steven M., Smith, David C.
Format Journal Article
LanguageEnglish
Published Weinheim WILEY-VCH Verlag 06.11.2009
WILEY‐VCH Verlag
Subjects
CdS chalcogenide
Continuous flow
Semiconductors
Supercritical fluids
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ISSN0935-9648
1521-4095
DOI10.1002/adma.200803751

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Summary:Supercritical chemical fluid deposition (SCFD) has been shown to have remarkable advantages for deposition inside nanostructured templates however so far the technique has mostly been used to deposit metals. In this paper we present the SCFD of optoelectronic grade CdS. The quality of this material is demonstrated by a range of techniques including reflectivity (A) and photoluminescence spectroscopy (B and C). At 4 K the bandedge luminescence has a full‐width‐at‐half‐maximum linewidth of 30 meV comparable with that of single crystal CdS.
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ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200803751