Wet chemical synthesis of WO3 thin films for supercapacitor application

• Published in: The Korean journal of chemical engineering Vol. 32; no. 5; pp. 974 - 979
• Main Authors: Shinde, Nanasaheb Madhukar, Jagadale, Ajay Dattu, Kumbhar, Vijay Shamrao, Rana, Tanka Raj, Kim, JunHo, Lokhande, Chandrakant Dnyandev
• Format: Journal Article
• Language: English
• Published: New York Springer US 01.05.2015; 한국화학공학회
• Subjects: Biotechnology; Catalysis; Chemistry; Chemistry and Materials Science; Electronic; Industrial Chemistry/Chemical Engineering; Inorganic; Materials (Organic; Materials Science; Thin Films; 화학공학; Wet Chemical Synthesis; X-ray Diffraction; Super Capacitor; SILAR
• ISSN: 0256-1115; 1975-7220
• DOI: 10.1007/s11814-014-0323-9

Tungstic oxide (WO 3 ) thin films have been synthesized by wet chemical method, i.e., successive ionic layer adsorption and reaction (SILAR) method. These films are characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM) and optical absorption techniques. The XRD pattern revealed the formation of polycrystalline WO 3 films. Scanning electron micrographs demonstrate the three-dimensional aggregated irregular extended rod shaped morphology of WO 3 thin films. The WO 3 film showed a direct band gap of 2.5 eV. The WO 3 film exhibited specific capacitance of 266 F·g −1 in 1 M Na 2 SO 4 electrolyte at the scan rate of 10 mVs −1 .