Critically coupled silicon Fabry-Perot photodetectors based on the internal photoemission effect at 1550 nm

In this paper, design, fabrication and characterization of an all-silicon photodetector (PD) at 1550 nm, have been reported. Our device is a surface-illuminated PD constituted by a Fabry-Perot microcavity incorporating a Cu/p-Si Schottky diode. Its absorption mechanism, based on the internal photoem...

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Published inOptics express Vol. 20; no. 11; p. 12599
Main Authors Casalino, Maurizio, Coppola, Giuseppe, Iodice, Mario, Rendina, Ivo, Sirleto, Luigi
Format Journal Article
LanguageEnglish
Published United States 21.05.2012
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ISSN1094-4087
1094-4087
DOI10.1364/OE.20.012599

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Summary:In this paper, design, fabrication and characterization of an all-silicon photodetector (PD) at 1550 nm, have been reported. Our device is a surface-illuminated PD constituted by a Fabry-Perot microcavity incorporating a Cu/p-Si Schottky diode. Its absorption mechanism, based on the internal photoemission effect (IPE), has been enhanced by critical coupling condition. Our experimental findings prove a peak responsivity of 0.063 mA/W, which is the highest value obtained in a surface-illuminated IPE-based Si PD around 1550 nm. Finally, device capacitance measurements have been carried out demonstrating a capacitance < 5 pF which has the potential for GHz operation subject to a reduction of the series resistance of the ohmic contact.
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ISSN:1094-4087
1094-4087
DOI:10.1364/OE.20.012599