Off-state avalanche breakdown induced degradation in 20 V NLDMOS devices
Degradation behaviors of 20 V NLDMOS operated under off-state avalanche breakdown conditions are presented.A constant current pulse stressing test is applied to the device.Two different degradation mechanisms are identified by analysis of electrical data,technology computer-aided design(TCAD) simula...
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Published in | Journal of semiconductors Vol. 31; no. 9; pp. 37 - 40 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
IOP Publishing
01.09.2010
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Subjects | |
Online Access | Get full text |
ISSN | 1674-4926 |
DOI | 10.1088/1674-4926/31/9/094006 |
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Abstract | Degradation behaviors of 20 V NLDMOS operated under off-state avalanche breakdown conditions are presented.A constant current pulse stressing test is applied to the device.Two different degradation mechanisms are identified by analysis of electrical data,technology computer-aided design(TCAD) simulations and charge pumping measurements.The first mechanism is attributed to positive oxide-trapped charges in the N-type drift region,and the second one is due to decreased electron mobility upon interface state formation in the drift region.Both of the mechanisms are enhanced with increasing avalanche breakdown current. |
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AbstractList | Degradation behaviors of 20 V NLDMOS operated under off-state avalanche breakdown conditions are presented.A constant current pulse stressing test is applied to the device.Two different degradation mechanisms are identified by analysis of electrical data,technology computer-aided design(TCAD) simulations and charge pumping measurements.The first mechanism is attributed to positive oxide-trapped charges in the N-type drift region,and the second one is due to decreased electron mobility upon interface state formation in the drift region.Both of the mechanisms are enhanced with increasing avalanche breakdown current. |
Author | 张世锋 丁扣宝 韩雁 韩成功 胡佳贤 张斌 |
AuthorAffiliation | Institute of Microelectronics & Photoelectronics, Zhejiang University, Hangzhou 310027, China |
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Cites_doi | 10.1109/TED.2004.834913 10.1109/TED.2004.824688 10.1109/LED.2007.907416 10.1109/TDMR.2007.912274 10.1109/TDMR.2006.881461 10.1109/TDMR.2006.882212 10.1109/TED.2008.924866 10.1109/TDMR.2006.883558 |
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Notes | NLDMOS O633.14 TN322.8 degradation NLDMOS; avalanche breakdown; degradation; charge-pumping charge-pumping 11-5781/TN avalanche breakdown |
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Snippet | Degradation behaviors of 20 V NLDMOS operated under off-state avalanche breakdown conditions are presented.A constant current pulse stressing test is applied... |
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StartPage | 37 |
SubjectTerms | TCAD 器械 接口状态 电流脉冲 计算机辅助设计 退化机制 降解行为 雪崩击穿 |
Title | Off-state avalanche breakdown induced degradation in 20 V NLDMOS devices |
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