Top-down nanofabrication approaches toward single-digit-nanometer scale structures

• Published in: Journal of mechanical science and technology Vol. 35; no. 3; pp. 837 - 859
• Main Authors: Oh, Dong Kyo, Jeong, Heonyeong, Kim, Joohoon, Kim, Yeseul, Kim, Inki, Ok, Jong G., Rho, Junsuk
• Format: Journal Article
• Language: English
• Published: Seoul Korean Society of Mechanical Engineers 01.03.2021; Springer Nature B.V; 대한기계학회
• Subjects: Atomic layer epitaxy; Control; Controllability; Dynamical Systems; Electron beam lithography; Electronic devices; Engineering; Industrial and Production Engineering; Invited Review Article; Ion beams; Mechanical Engineering; Nanofabrication; Nanostructure; Optical trapping; Quantum tunnelling; Sensors; Vibration; 기계공학; Nanostructure fabrication; Sub-10 nm; Advanced nanofabrication technique; Nanophotonic devices; Nanogap fabrication; Single-digit-nanometer
• ISSN: 1738-494X; 1976-3824
• DOI: 10.1007/s12206-021-0243-7

Sub-10 nm nanostructures have received broad interest for their intriguing nano-optical phenomena, such as extreme field localization and enhancement, quantum tunneling effect, and strong coupling. The range of cutting-edge applications based on single-digit-nanometer scale structures has expanded with the development of nanofabrication technologies. However, challenges still remain in overcoming fabrication limits, such as scalability, controllability, and reproducibility for further practical applications of the sub-10 nm nanostructures. In this review, we discuss the recent advances in top-down nanofabrication methods towards single-digit-nanometer-sized structures. The well-known examples include electron beam lithography (EBL), focused ion beam (FIB) milling or lithography, atomic layer deposition (ALD), and other unconventional techniques to obtain sub-10 nm nanostructures or nanogaps. We discuss state-of-the-art applications for sub-10 nm nanophotonics such as optical trapping or sensing devices, imaging devices, and electronic devices.