Effect of sputtering pressure and rapid thermal annealing on optical properties of Ta2O5 thin films

Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing（RTA）. Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta205 thin film...

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Published inTransactions of Nonferrous Metals Society of China Vol. 19; no. 2; pp. 359 - 363
Main Author 周继承 罗迪恬 李幼真 刘正
Format Journal Article
LanguageEnglish
Published School of Physics Science and Technology, Central South University, Changsha 410083, China 01.04.2009
Subjects
Ta2O5
光学性质
快速热退火
直流反应磁控溅射
薄膜沉积
退火温度
钽薄膜
Ta2O5 thin films
rapid thermal annealing(RTA)
DC reactive magnetron sputtering
sputtering pressure
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ISSN1003-6326
DOI10.1016/S1003-6326(08)60278-2

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Summary:Ta2O5 thin films were deposited by DC reactive magnetron sputtering followed by rapid thermal annealing（RTA）. Influence of sputtering pressure and annealing temperature on surface characteristics, microstructure and optical property of Ta2O5 thin films were investigated. As-deposited Ta205 thin films are amorphous. It takes hexagonal structure （δ-Ta2O5） after being annealed at 800 ℃. A transition from δ-Ta2O5 to orthorhombic structure （L-Ta2O5） occurs at 900-1 000 ℃. Surface roughness is decreased after annealing at low temperature. Refractive index and extinction coefficient are decreased when annealing temperature is increased.
Bibliography:Ta2O5 thin films; DC reactive magnetron sputtering; sputtering pressure; rapid thermal annealing（RTA）
rapid thermal annealing（RTA）
43-1239/TG
Ta2O5 thin films
DC reactive magnetron sputtering
TN304.21
TN304.23
sputtering pressure
ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1003-6326
DOI:10.1016/S1003-6326(08)60278-2