Through-thickness texture gradient of tantalum sputtering target

For sputtering targets, through-thickness texture is critical for assuring reliable sputtering performance.In this paper, through-thickness texture gradient of a rolled and subsequently annealed tantalum sputtering target was investigated. The results show that by carefully controlling the rolling p...

Full description

Saved in:
Bibliographic Details
Published inRare metals Vol. 36; no. 6; pp. 523 - 526
Main Authors Deng, Chao, Liu, Shi-Feng, Hao, Xiao-Bo, Ji, Jing-Li, Liu, Qing, Fan, Hai-Yang
Format Journal Article
LanguageEnglish
Published Beijing Nonferrous Metals Society of China 01.06.2017
Springer Nature B.V
Subjects
Online AccessGet full text
ISSN1001-0521
1867-7185
DOI10.1007/s12598-014-0407-z

Cover

Abstract For sputtering targets, through-thickness texture is critical for assuring reliable sputtering performance.In this paper, through-thickness texture gradient of a rolled and subsequently annealed tantalum sputtering target was investigated. The results show that by carefully controlling the rolling process, shear-related components at the surface of the rolled sample could be avoided. Both the rolled sample and the annealed target develop a through-thickness texture gradient with the formation of a stronger {1 1 1}fiber in the center layer compared with that in the surface layer.
AbstractList For sputtering targets, through-thickness texture is critical for assuring reliable sputtering performance. In this paper, through-thickness texture gradient of a rolled and subsequently annealed tantalum sputtering target was investigated. The results show that by carefully controlling the rolling process, shear-related components at the surface of the rolled sample could be avoided. Both the rolled sample and the annealed target develop a through-thickness texture gradient with the formation of a stronger {1 1 1} fiber in the center layer compared with that in the surface layer.
Author Chao Deng Shi-Feng Liu Xiao-Bo Hao Jing-Li Ji Qing Liu Hai-Yang Fan
AuthorAffiliation College of Materials Science and Engineering, ChongqingUniversity, Chongqing 400044, China
Author_xml – sequence: 1
  givenname: Chao
  surname: Deng
  fullname: Deng, Chao
  organization: College of Materials Science and Engineering, Chongqing University
– sequence: 2
  givenname: Shi-Feng
  surname: Liu
  fullname: Liu, Shi-Feng
  email: dc2003121106@126.com
  organization: College of Materials Science and Engineering, Chongqing University
– sequence: 3
  givenname: Xiao-Bo
  surname: Hao
  fullname: Hao, Xiao-Bo
  organization: College of Materials Science and Engineering, Chongqing University
– sequence: 4
  givenname: Jing-Li
  surname: Ji
  fullname: Ji, Jing-Li
  organization: College of Materials Science and Engineering, Chongqing University
– sequence: 5
  givenname: Qing
  surname: Liu
  fullname: Liu, Qing
  organization: College of Materials Science and Engineering, Chongqing University
– sequence: 6
  givenname: Hai-Yang
  surname: Fan
  fullname: Fan, Hai-Yang
  organization: College of Materials Science and Engineering, Chongqing University
BookMark eNp9kE1LAzEURYNUsK3-AHeDrqMvH5OkO6X4BQU3dR0ymcx0aptpkwxof71TWkRcdJVHuOfdxxmhgW-9Q-iawB0BkPeR0HyiMBCOgYPEuzM0JEpILInKB_0MQDDklFygUYxLAM6FgCF6mC9C29ULnBaN_fQuxiy5r9QFl9XBlI3zKWurLBmfzKpbZ3HTpeRC4-v-L9QuXaLzyqyiuzq-Y_Tx_DSfvuLZ-8vb9HGGLeMs4UlZKEqY4XlJi7wCQ6RyShLDmc2tkaZivLIGREGokIUSFRSM5tYqVXKgFRuj28PeTWi3nYtJL9su-L5SkwkIlqs-1qfkIWVDG2NwlbZNMqlpfQqmWWkCeq9LH3TpXpfe69K7niT_yE1o1iZ8n2TogYmbvREX_tx0Aro5Fi1aX2977rdJSEapEIqwH3rei0w
CitedBy_id crossref_primary_10_3390_met9030358
crossref_primary_10_1016_j_pnsc_2019_08_007
crossref_primary_10_1007_s11042_019_7340_y
crossref_primary_10_3390_ma12010169
crossref_primary_10_1016_j_ijrmhm_2024_106713
crossref_primary_10_1016_j_ijrmhm_2018_08_012
crossref_primary_10_1016_j_jnucmat_2023_154893
Cites_doi 10.1116/1.574531
10.1016/0956-716X(92)90140-A
10.1007/s12666-012-0148-3
10.1109/TASC.2005.849043
10.4028/www.scientific.net/MSF.408-412.1615
10.1007/s11837-001-0103-y
10.1016/S0921-5093(03)00305-8
10.1007/s11661-000-0146-7
10.1007/BF02811649
10.1007/s11664-001-0040-0
10.1007/BF02669871
10.1016/j.mee.2005.06.001
10.1007/s11664-002-0165-9
10.1023/A:1015230727381
10.1007/s11664-005-0159-5
10.1063/1.104051
10.1007/BF00188954
10.1007/s11661-005-0200-6
10.1016/j.matlet.2007.04.074
ContentType Journal Article
Copyright The Nonferrous Metals Society of China and Springer-Verlag Berlin Heidelberg 2014
Rare Metals is a copyright of Springer, 2017.
Copyright_xml – notice: The Nonferrous Metals Society of China and Springer-Verlag Berlin Heidelberg 2014
– notice: Rare Metals is a copyright of Springer, 2017.
DBID 2RA
92L
CQIGP
W92
~WA
AAYXX
CITATION
8BQ
8FD
8FE
8FG
ABJCF
AEUYN
AFKRA
BENPR
BGLVJ
CCPQU
D1I
DWQXO
HCIFZ
JG9
KB.
L6V
M7S
PDBOC
PHGZM
PHGZT
PKEHL
PQEST
PQGLB
PQQKQ
PQUKI
PRINS
PTHSS
DOI 10.1007/s12598-014-0407-z
DatabaseName 维普期刊资源整合服务平台
中文科技期刊数据库-CALIS站点
维普中文期刊数据库
中文科技期刊数据库-工程技术
中文科技期刊数据库- 镜像站点
CrossRef
METADEX
Technology Research Database
ProQuest SciTech Collection
ProQuest Technology Collection
Materials Science & Engineering Collection
ProQuest One Sustainability
ProQuest Central UK/Ireland
ProQuest Central
Technology Collection
ProQuest One Community College
ProQuest Materials Science Collection
ProQuest Central Korea
SciTech Premium Collection (UHCL Subscription)
Materials Research Database
Materials Science Database
ProQuest Engineering Collection
Engineering Database
Materials Science Collection
Proquest Central Premium
ProQuest One Academic (New)
ProQuest One Academic Middle East (New)
ProQuest One Academic Eastern Edition (DO NOT USE)
ProQuest One Applied & Life Sciences
ProQuest One Academic
ProQuest One Academic UKI Edition
ProQuest Central China
Engineering Collection
DatabaseTitle CrossRef
Materials Research Database
Technology Collection
Technology Research Database
ProQuest One Academic Middle East (New)
Materials Science Collection
SciTech Premium Collection
ProQuest One Community College
ProQuest Central China
ProQuest Central
ProQuest One Applied & Life Sciences
ProQuest One Sustainability
ProQuest Engineering Collection
ProQuest Central Korea
Materials Science Database
ProQuest Central (New)
Engineering Collection
ProQuest Materials Science Collection
Engineering Database
ProQuest One Academic Eastern Edition
ProQuest Technology Collection
ProQuest SciTech Collection
METADEX
ProQuest One Academic UKI Edition
Materials Science & Engineering Collection
ProQuest One Academic
ProQuest One Academic (New)
DatabaseTitleList Materials Research Database


Database_xml – sequence: 1
  dbid: 8FG
  name: ProQuest Technology Collection
  url: https://search.proquest.com/technologycollection1
  sourceTypes: Aggregation Database
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
DocumentTitleAlternate Through-thickness texture gradient of tantalum sputtering target
EISSN 1867-7185
EndPage 526
ExternalDocumentID 10_1007_s12598_014_0407_z
673226681
GroupedDBID --K
-EM
06D
0R~
0VY
188
1B1
29P
2B.
2C0
2KG
2RA
2VQ
30V
4.4
406
408
40D
5VR
5VS
8FE
8FG
8RM
8TC
92H
92I
92L
92R
93N
96X
AAAVM
AAEDT
AAFGU
AAHNG
AAIAL
AAJKR
AALRI
AANZL
AARHV
AARTL
AATNV
AATVU
AAUYE
AAWCG
AAXUO
AAYFA
AAYIU
AAYQN
AAYTO
AAZMS
ABDZT
ABECU
ABFGW
ABFTD
ABFTV
ABJCF
ABJNI
ABJOX
ABKAS
ABKCH
ABMQK
ABQBU
ABSXP
ABTEG
ABTHY
ABTKH
ABTMW
ABXPI
ACAOD
ACBMV
ACBRV
ACBXY
ACBYP
ACGFS
ACHSB
ACIGE
ACIPQ
ACIWK
ACKNC
ACMDZ
ACMLO
ACOKC
ACTTH
ACVWB
ACWMK
ACZOJ
ADHHG
ADHIR
ADINQ
ADKNI
ADMDM
ADMUD
ADOXG
ADRFC
ADURQ
ADYFF
ADZKW
AEBTG
AEFTE
AEGNC
AEJHL
AEJRE
AENEX
AEOHA
AEPYU
AESKC
AESTI
AETCA
AEVLU
AEVTX
AEXYK
AFGCZ
AFKRA
AFLOW
AFNRJ
AFQWF
AFUIB
AFWTZ
AFZKB
AGAYW
AGDGC
AGGBP
AGJBK
AGMZJ
AGQMX
AGWZB
AGYKE
AHAVH
AHBYD
AHSBF
AHYZX
AIAKS
AIIXL
AILAN
AIMYW
AITGF
AJBLW
AJDOV
AJRNO
AJZVZ
AKQUC
ALFXC
ALMA_UNASSIGNED_HOLDINGS
AMKLP
AMXSW
AMYLF
AMYQR
ANMIH
AOCGG
AXYYD
BA0
BENPR
BGLVJ
BGNMA
CAG
CCEZO
CCPQU
CDRFL
CHBEP
COF
CQIGP
CW9
D1I
DDRTE
DNIVK
DPUIP
DU5
EBLON
EBS
EIOEI
EJD
EO9
ESBYG
FA0
FDB
FERAY
FFXSO
FIGPU
FINBP
FNLPD
FRRFC
FSGXE
FYJPI
GGCAI
GGRSB
GJIRD
GQ6
GQ7
HCIFZ
HF~
HG6
HLICF
HMJXF
HRMNR
HZ~
I0C
IKXTQ
IWAJR
I~X
J-C
JBSCW
JZLTJ
KB.
KOV
LLZTM
M41
M4Y
MA-
NPVJJ
NQJWS
NU0
O9-
O9J
P9N
PDBOC
PT4
Q2X
R9I
RIG
RLLFE
ROL
RSV
S1Z
S27
S3B
SCL
SCM
SDC
SDG
SDH
SHX
SNE
SNPRN
SNX
SOHCF
SOJ
SPISZ
SQXTU
SRMVM
SSLCW
STPWE
T13
TCJ
TGT
TSG
U2A
UG4
UGNYK
UOJIU
UTJUX
UZ4
UZXMN
VC2
VFIZW
W48
W92
WK8
Z7R
Z7S
Z7V
Z7X
Z7Y
Z7Z
Z83
Z85
Z88
ZMTXR
~A9
~WA
-SB
-S~
5XA
5XC
AACDK
AAJBT
AASML
AAXDM
AAYZH
ABAKF
ABWVN
ACDTI
ACPIV
ACRPL
ADMLS
ADNMO
AEFQL
AEMSY
AFBBN
AGQEE
AGRTI
AIGIU
CAJEB
H13
Q--
SJYHP
U1G
U5L
UY8
AAPKM
AAYXX
ABBRH
ABDBE
ABFSG
ACSTC
AEZWR
AFDZB
AFHIU
AFOHR
AHPBZ
AHWEU
AIGII
AIXLP
ATHPR
AYFIA
CITATION
PHGZM
PHGZT
8BQ
8FD
ABRTQ
AEUYN
DWQXO
JG9
L6V
M7S
PKEHL
PQEST
PQGLB
PQQKQ
PQUKI
PRINS
PTHSS
PUEGO
ID FETCH-LOGICAL-c343t-9db8213a45d2b5f0a178e871a43c5ca7af34fca06b1267b86f0b325cc88d402f3
IEDL.DBID U2A
ISSN 1001-0521
IngestDate Thu Sep 25 00:56:03 EDT 2025
Thu Apr 24 23:12:32 EDT 2025
Tue Jul 01 01:30:02 EDT 2025
Fri Feb 21 02:43:29 EST 2025
Wed Feb 14 09:57:25 EST 2024
IsPeerReviewed true
IsScholarly true
Issue 6
Keywords Electron backscatter diffraction
Texture
Tantalum sputtering target
Recrystallization
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c343t-9db8213a45d2b5f0a178e871a43c5ca7af34fca06b1267b86f0b325cc88d402f3
Notes Recrystallization; Texture; Tantalumsputtering target; Electron backscatter diffraction
For sputtering targets, through-thickness texture is critical for assuring reliable sputtering performance.In this paper, through-thickness texture gradient of a rolled and subsequently annealed tantalum sputtering target was investigated. The results show that by carefully controlling the rolling process, shear-related components at the surface of the rolled sample could be avoided. Both the rolled sample and the annealed target develop a through-thickness texture gradient with the formation of a stronger {1 1 1}fiber in the center layer compared with that in the surface layer.
11-2112/TF
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 14
PQID 1906358402
PQPubID 326325
PageCount 4
ParticipantIDs proquest_journals_1906358402
crossref_citationtrail_10_1007_s12598_014_0407_z
crossref_primary_10_1007_s12598_014_0407_z
springer_journals_10_1007_s12598_014_0407_z
chongqing_primary_673226681
ProviderPackageCode CITATION
AAYXX
PublicationCentury 2000
PublicationDate 2017-06-01
PublicationDateYYYYMMDD 2017-06-01
PublicationDate_xml – month: 06
  year: 2017
  text: 2017-06-01
  day: 01
PublicationDecade 2010
PublicationPlace Beijing
PublicationPlace_xml – name: Beijing
PublicationTitle Rare metals
PublicationTitleAbbrev Rare Met
PublicationTitleAlternate Rare Metals
PublicationYear 2017
Publisher Nonferrous Metals Society of China
Springer Nature B.V
Publisher_xml – name: Nonferrous Metals Society of China
– name: Springer Nature B.V
References Merchant, Kang, Sanganeria, Schravendijk, Mountsier (CR1) 2001; 53
Aditya, Subramanian, Krishna, Babu (CR10) 2012; 65
Michaluk, Field, Nibur, Wright, Witt (CR14) 2002; 408
Engler, Tomé, Huh (CR15) 2000; 31
Holloway, Fryer (CR3) 1990; 57
Field, Yanke, Mcgowan, Michaluk (CR11) 2005; 34
CR8
Shacham-Diamand (CR2) 2001; 30
Chen, Zhen, Shao, Dai, Cui (CR16) 2008; 62
Mathaudhu, Barber, Hartwig (CR12) 2005; 15
Latt, Park, Li (CR5) 2002; 37
Jang, Lee, Baik (CR4) 1996; 7
Wei, Jiao, Mathaudhu, Ma, Hartwig, Ramesh (CR13) 2003; 358
Michaluk (CR7) 2002; 31
Vandermeer, Snyder (CR18) 1979; 10
Clark, Garrett, Jungling, Vandermeer, Vold (CR20) 1991; 22
Raabe, Lücke (CR19) 1992; 27
Wickersham (CR9) 1987; 5
Kumar, Kumar, Paul (CR6) 2005; 82
Liu, Banovic, Biancaniello, Jiggetts (CR17) 2005; 36
SY Jang (407_CR4) 1996; 7
DP Field (407_CR11) 2005; 34
Q Wei (407_CR13) 2003; 358
M Kumar (407_CR6) 2005; 82
Y Shacham-Diamand (407_CR2) 2001; 30
JZ Chen (407_CR16) 2008; 62
SM Merchant (407_CR1) 2001; 53
J Liu (407_CR17) 2005; 36
KM Latt (407_CR5) 2002; 37
CA Michaluk (407_CR14) 2002; 408
D Raabe (407_CR19) 1992; 27
CE Wickersham (407_CR9) 1987; 5
AV Aditya (407_CR10) 2012; 65
K Holloway (407_CR3) 1990; 57
CA Michaluk (407_CR7) 2002; 31
RA Vandermeer (407_CR18) 1979; 10
O Engler (407_CR15) 2000; 31
407_CR8
SN Mathaudhu (407_CR12) 2005; 15
JB Clark (407_CR20) 1991; 22
References_xml – volume: 5
  start-page: 1755
  issue: 4
  year: 1987
  ident: CR9
  article-title: Crystallographic target effects in magnetron sputtering
  publication-title: J Vac Sci Technol A
  doi: 10.1116/1.574531
– volume: 27
  start-page: 1533
  issue: 11
  year: 1992
  ident: CR19
  article-title: Annealing textures of bcc metals
  publication-title: Scr Metall Mater
  doi: 10.1016/0956-716X(92)90140-A
– volume: 65
  start-page: 435
  issue: 5
  year: 2012
  ident: CR10
  article-title: Influence of rolling path on microstructure and mechanical properties in EB refined tantalum
  publication-title: Trans Indian Inst Met
  doi: 10.1007/s12666-012-0148-3
– volume: 15
  start-page: 3434
  issue: 2
  year: 2005
  ident: CR12
  article-title: Microstructural refinement of tantalum for Nb Sn superconductor diffusion barriers
  publication-title: IEEE Trans Appl Supercond
  doi: 10.1109/TASC.2005.849043
– volume: 408
  start-page: 1615
  year: 2002
  ident: CR14
  article-title: Effects of local texture and grain structure on the sputtering performance of tantalum
  publication-title: Mater Sci Forum
  doi: 10.4028/www.scientific.net/MSF.408-412.1615
– volume: 53
  start-page: 43
  issue: 6
  year: 2001
  ident: CR1
  article-title: Copper interconnects for semiconductor devices
  publication-title: JOM
  doi: 10.1007/s11837-001-0103-y
– volume: 358
  start-page: 266
  issue: 1
  year: 2003
  ident: CR13
  article-title: Microstructure and mechanical properties of tantalum after equal channel angular extrusion (ECAE)
  publication-title: Mater Sci Eng A
  doi: 10.1016/S0921-5093(03)00305-8
– volume: 31
  start-page: 2299
  issue: 9
  year: 2000
  ident: CR15
  article-title: A study of through-thickness texture gradients in rolled sheets
  publication-title: Metall Mater Trans A
  doi: 10.1007/s11661-000-0146-7
– volume: 10
  start-page: 1031
  issue: 8
  year: 1979
  ident: CR18
  article-title: Recovery and recrystallization in rolled tantalum single crystals
  publication-title: Metall Trans A
  doi: 10.1007/BF02811649
– volume: 30
  start-page: 336
  issue: 4
  year: 2001
  ident: CR2
  article-title: Barrier layers for Cu ULSI metallization
  publication-title: J Electron Mater
  doi: 10.1007/s11664-001-0040-0
– volume: 22
  start-page: 2039
  issue: 9
  year: 1991
  ident: CR20
  article-title: Effect of processing variables on texture and texture gradients in tantalum
  publication-title: Metall Trans A
  doi: 10.1007/BF02669871
– volume: 82
  start-page: 53
  issue: 1
  year: 2005
  ident: CR6
  article-title: Thermal stability of tantalum nitride diffusion barriers for Cu metallization formed using plasma immersion ion implantation
  publication-title: Microelectron Eng
  doi: 10.1016/j.mee.2005.06.001
– volume: 31
  start-page: 2
  issue: 1
  year: 2002
  ident: CR7
  article-title: Correlating discrete orientation and grain size to the sputter deposition properties of tantalum
  publication-title: J Electron Mater
  doi: 10.1007/s11664-002-0165-9
– volume: 37
  start-page: 1941
  issue: 10
  year: 2002
  ident: CR5
  article-title: Behavior of ionized metal plasma deposited Ta diffusion barrier between Cu and SiO
  publication-title: J Mater Sci
  doi: 10.1023/A:1015230727381
– ident: CR8
– volume: 34
  start-page: 1521
  issue: 12
  year: 2005
  ident: CR11
  article-title: Microstructural development in asymmetric processing of tantalum plate
  publication-title: J Electron Mater
  doi: 10.1007/s11664-005-0159-5
– volume: 57
  start-page: 1736
  issue: 17
  year: 1990
  ident: CR3
  article-title: Tantalum as a diffusion barrier between copper and silicon
  publication-title: Appl Phys Lett
  doi: 10.1063/1.104051
– volume: 7
  start-page: 271
  issue: 4
  year: 1996
  ident: CR4
  article-title: Tantalum and niobium as a diffusion barrier between copper and silicon
  publication-title: J Electron Mater
  doi: 10.1007/BF00188954
– volume: 36
  start-page: 869
  issue: 3
  year: 2005
  ident: CR17
  article-title: Through-thickness texture gradient in an annealed Al-Mg Alloy sheet
  publication-title: Metall Mater Trans A
  doi: 10.1007/s11661-005-0200-6
– volume: 62
  start-page: 88
  issue: 1
  year: 2008
  ident: CR16
  article-title: Through-thickness texture gradient in AA 7055 aluminum alloy
  publication-title: Mater Lett
  doi: 10.1016/j.matlet.2007.04.074
– volume: 57
  start-page: 1736
  issue: 17
  year: 1990
  ident: 407_CR3
  publication-title: Appl Phys Lett
  doi: 10.1063/1.104051
– volume: 7
  start-page: 271
  issue: 4
  year: 1996
  ident: 407_CR4
  publication-title: J Electron Mater
– volume: 408
  start-page: 1615
  year: 2002
  ident: 407_CR14
  publication-title: Mater Sci Forum
  doi: 10.4028/www.scientific.net/MSF.408-412.1615
– volume: 65
  start-page: 435
  issue: 5
  year: 2012
  ident: 407_CR10
  publication-title: Trans Indian Inst Met
  doi: 10.1007/s12666-012-0148-3
– volume: 27
  start-page: 1533
  issue: 11
  year: 1992
  ident: 407_CR19
  publication-title: Scr Metall Mater
  doi: 10.1016/0956-716X(92)90140-A
– volume: 22
  start-page: 2039
  issue: 9
  year: 1991
  ident: 407_CR20
  publication-title: Metall Trans A
  doi: 10.1007/BF02669871
– volume: 31
  start-page: 2
  issue: 1
  year: 2002
  ident: 407_CR7
  publication-title: J Electron Mater
  doi: 10.1007/s11664-002-0165-9
– volume: 5
  start-page: 1755
  issue: 4
  year: 1987
  ident: 407_CR9
  publication-title: J Vac Sci Technol A
  doi: 10.1116/1.574531
– volume: 358
  start-page: 266
  issue: 1
  year: 2003
  ident: 407_CR13
  publication-title: Mater Sci Eng A
  doi: 10.1016/S0921-5093(03)00305-8
– volume: 36
  start-page: 869
  issue: 3
  year: 2005
  ident: 407_CR17
  publication-title: Metall Mater Trans A
  doi: 10.1007/s11661-005-0200-6
– volume: 82
  start-page: 53
  issue: 1
  year: 2005
  ident: 407_CR6
  publication-title: Microelectron Eng
  doi: 10.1016/j.mee.2005.06.001
– volume: 37
  start-page: 1941
  issue: 10
  year: 2002
  ident: 407_CR5
  publication-title: J Mater Sci
  doi: 10.1023/A:1015230727381
– volume: 31
  start-page: 2299
  issue: 9
  year: 2000
  ident: 407_CR15
  publication-title: Metall Mater Trans A
  doi: 10.1007/s11661-000-0146-7
– volume: 62
  start-page: 88
  issue: 1
  year: 2008
  ident: 407_CR16
  publication-title: Mater Lett
  doi: 10.1016/j.matlet.2007.04.074
– volume: 10
  start-page: 1031
  issue: 8
  year: 1979
  ident: 407_CR18
  publication-title: Metall Trans A
  doi: 10.1007/BF02811649
– ident: 407_CR8
– volume: 15
  start-page: 3434
  issue: 2
  year: 2005
  ident: 407_CR12
  publication-title: IEEE Trans Appl Supercond
  doi: 10.1109/TASC.2005.849043
– volume: 53
  start-page: 43
  issue: 6
  year: 2001
  ident: 407_CR1
  publication-title: JOM
  doi: 10.1007/s11837-001-0103-y
– volume: 30
  start-page: 336
  issue: 4
  year: 2001
  ident: 407_CR2
  publication-title: J Electron Mater
  doi: 10.1007/s11664-001-0040-0
– volume: 34
  start-page: 1521
  issue: 12
  year: 2005
  ident: 407_CR11
  publication-title: J Electron Mater
  doi: 10.1007/s11664-005-0159-5
SSID ssj0044660
Score 2.1039205
Snippet For sputtering targets, through-thickness texture is critical for assuring reliable sputtering performance.In this paper, through-thickness texture gradient of...
For sputtering targets, through-thickness texture is critical for assuring reliable sputtering performance. In this paper, through-thickness texture gradient...
SourceID proquest
crossref
springer
chongqing
SourceType Aggregation Database
Enrichment Source
Index Database
Publisher
StartPage 523
SubjectTerms Annealing
Biomaterials
Chemistry and Materials Science
Energy
Materials Engineering
Materials Science
Metallic Materials
Nanoscale Science and Technology
Physical Chemistry
Shear
Sputtering
Surface layers
Tantalum
Texture
厚度
梯度
溅射靶材
相关成分
织构
表面层
轧制过程

SummonAdditionalLinks – databaseName: ProQuest Central
  dbid: BENPR
  link: http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8QwEB50vehBfOLqKj14UoJt07TZg_hiRQQXkV3wVvJoFJR978Vf70zbuCoo9NYmh0k630zmy3wAx8IijGkTMotowpK4yJgSmWUIZalM8SksXXB-6KZ3_eT-WTwvQdffhSFapfeJpaO2Q0Nn5GcIXIiNmI7EF6MxI9Uoqq56CQ1VSyvY87LF2DKsoEsWYQNWrjvdxyfvm6l4WfUnoCQakcvXOcvLdJgJELGLiBlhxj6o28LrcPAyRgz5iVqLUPRX9bQEpdsNWK-jyeCqWv5NWCoGW7D2rcfgNlz2KiUeRsT2N3JsAZE95pMieJmUfK9ZMHQBiQkrdFTBdFRKV-PYoGKJ70D_ttO7uWO1bAIzPOEz1rZaxhFXibCxFi5UUSYLzItUwo0wKlOOJ86oMNVRnGZapi7UPBbGSGnRvI7vQmMwHBR7ECRtzjEi4rZtRaKEbEtMYJxLI-0ibW3chIMvE-Wjqj0GMcUwpktl1ITQGy03dcdxEr54zxe9ksnmOdo8J5vnH004-Rri5_vn45Zfibz-86b5Yp804dSvzrfXf022__9kB7AaE6CX5y8taMwm8-IQw5GZPqr32CeUINrR
  priority: 102
  providerName: ProQuest
Title Through-thickness texture gradient of tantalum sputtering target
URI http://lib.cqvip.com/qk/85314X/201706/673226681.html
https://link.springer.com/article/10.1007/s12598-014-0407-z
https://www.proquest.com/docview/1906358402
Volume 36
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlV3dS8MwED_c9qIP4ifOzdEHn5RA2zRt9uaUfaA4RDaYTyVpmglKN_fxsr_eSz-2KSoIhT40Scslvftd7pc7gEum0IzJyCYKrQnx3DggggWKoCnzuY9XrMwB58e-3xt69yM2ys9xzwu2exGSTDX15rAbInVDvDLECTsgqxJUmEknhYt46LYK9Wvik1kKAuMno3EqQpk_DWESKrxOkvEHvu6rYdqgzW8B0tTudA5gPweMViub4UPYiZMj2NtKI3gMN4Os2A4x3PU3o7ssw-dYzmJrPEspXQtroi1TL1igLrLm07Q6Nfa1MiL4CQw77cFdj-SVEUhEPbogTSW561DhMeVKpm3hBDxG10d4NGKRCISmno6E7UvH9QPJfW1L6rIo4lyhw6jpKZSTSRKfgeU1KUXQQ1VTMU8w3uToo2jtO1I7Uim3CrW1iMJplgHDkMEQtvncqYJdCC2M8qTiprbFe7hJh2xkHqLMQyPzcFWFq3WXYrw_GteLmQjzn2seIoZBmISeKX7cdTE7W49_G-z8X61rsOsaE57uuNShvJgt4wsEIAvZgBLvdBtQaXVfHtp4v233n54b6TL8BHVH1X4
linkProvider Springer Nature
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwtV1Lb9NAEB6V9AAcEE81tMAe4AJaYe_Ddg4Vz1YpbSOEUqm3ZR_eIoGSNEmF6I_jtzFje5uCRG-VfLM9smbH883sfjMD8FwHhDHnMx4QTbgSdcmtLgNHKCuqAq86UIHz4agYHqlPx_p4DX6nWhiiVSaf2DjqMPW0R_4agQuxEdMR8WZ2ymlqFJ2uphEathutELabFmNdYcd-_esnpnCL7b2PuN4vhNjdGX8Y8m7KAPdSySUfBFeJXFqlg3A6ZjYvqxrTCKuk196WNkoVvc0Kl4uidFURMyeF9r6qAn5NlCj3Bqwr2kDpwfr7ndHnLwkL6LC07YdASTsiZTpXbYr3MPMgIhkRQbKSn1N3h2_TyckpYtbfKLkKff85rW1AcPcu3OmiV_auNbd7sFZP7sPtSz0NH8DbcTv5hxOR_js5UkbkkrN5zU7mDb9syaaR0fBii46RLWbNqGx8l7Ws9IdwdC0KfAS9yXRSbwBTAykxApNhELSyuhpUmDDFWOQu5i4E0YfNCxWZWduOg5hpGEMWVd6HLCnN-K7DOQ3a-GFWvZlJ5wZ1bkjn5rwPLy9eSfKueHgrrYTp_vSFWdllH16l1bl0-3_CHl8t7BncHI4PD8zB3mh_E24JCiaavZ8t6C3nZ_UTDIWW7mlnbwy-XreJ_wFUDBfH
linkToPdf http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV1NT9wwEB3RRarKgdIvsUDbHHpqZUhiO_HeiloWWlrUA0j05PojphIou-xmL_vrO7OJWYraShVSbrEdx3Y8bzLPbwDeSI9mzLqUebQmTORVyYwsPUNTVqgCr8rTAeevJ8XRmfh8Ls-7PKfTyHaPIcn2TAOpNNXN3tiHveXBN0TtRMIiEkVasvkDWBWUQqIHq_uH348P4mZM0cpWkIC8ZjRVMbD5p0ZIXuHnqL64xof_bqaW2PNOuHRhhYaP4Ufsf0s-udydNXbXze9IO97jBTdgvUOoyX67pJ7ASlU_hbVbuoXP4P1pm92HEVn-kjbLhAgks0mVXEwWHLImGYWEEhQb3PyS6XiRDhvrJi3z_DmcDQ9OPxyxLhUDc1zwhg28VXnGjZA-tzKkJitVhb6WEdxJZ0oTuAjOpIXN8qK0qgip5bl0TimPHmrgL6BXj-pqExIx4BxRFvcDL4WRaqDQKQqhyGzIrPd5H7ZvZkGPW8kNYp8hTixU1oc0zot2nYo5JdO40kv9ZRo6jUOnaej0vA9vb6rE9v5ReCdOtu6-5qlG0IS4DF1h7Ny7OHe3bv-tsa3_Kv0aHn77ONRfPp0cb8OjnODD4m_PDvSayax6ieCnsa-6Bf4L30r6Ow
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Through-thickness+texture+gradient+of+tantalum+sputtering+target&rft.jtitle=Rare+metals&rft.au=Deng%2C+Chao&rft.au=Liu%2C+Shi-Feng&rft.au=Hao%2C+Xiao-Bo&rft.au=Ji%2C+Jing-Li&rft.date=2017-06-01&rft.pub=Nonferrous+Metals+Society+of+China&rft.issn=1001-0521&rft.eissn=1867-7185&rft.volume=36&rft.issue=6&rft.spage=523&rft.epage=526&rft_id=info:doi/10.1007%2Fs12598-014-0407-z&rft.externalDocID=10_1007_s12598_014_0407_z
thumbnail_s http://utb.summon.serialssolutions.com/2.0.0/image/custom?url=http%3A%2F%2Fimage.cqvip.com%2Fvip1000%2Fqk%2F85314X%2F85314X.jpg