Evaluating the Robustness of Top Coatings Comprising Plasma-Deposited Fluorocarbons in Electrowetting Systems

• Published in: Journal of adhesion science and technology Vol. 26; no. 12-17; pp. 2001 - 2015
• Main Authors: Papageorgiou, Dimitrios P., Koumoulos, Elias P., Charitidis, Costas A., Boudouvis, Andreas G., Papathanasiou, Athanasios G.
• Format: Journal Article
• Language: English
• Published: Routledge 01.09.2012
• Subjects: adhesion strength; Electrowetting; hydrophobic coating; nanoscratch; plasma fluorocarbon deposition
• ISSN: 0169-4243; 1568-5616
• DOI: 10.1163/156856111X600226

Thin dielectric stacks comprising a main insulating layer and a hydrophobic top coating are commonly used in low voltage electrowetting systems. However, in most cases, thin dielectrics fail to endure persistent electrowetting testing at high voltages, namely beyond the saturation onset, as electrolysis indicates dielectric failure. Careful sample inspection via optical microscopy revealed possible local delamination of the top coating under high electric fields. Thus, improvement in the adhesion strength of the hydrophobic top coating to the main dielectric is attempted through a plasma-deposited fluorocarbon interlayer. Interestingly enough the proposed dielectric stack exhibited (a) resistance to dielectric breakdown, (b) higher contact angle modulation range and (c) electrowetting cycle reversibility. Appearance of electrolysis in the saturation regime is inhibited, suggesting the use of this hydrophobic dielectric stack for the design of more efficient electrowetting systems. The possible causes of the improved performance are investigated by nanoscratch characterization.