Design of non-polarizing cut-off filters based on dielectric-metal-dielectric stacks

Cut-off filters are usually operating at oblique incidence and exhibit polarization dependence properties. We propose a simple approach to design cut-off filters with low linear polarization sensitivity (LPS) based on dielectric-metal-dielectric (DMD) stacks. The designing method is derived from the...

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Published inOptics express Vol. 21; no. 16; p. 19163
Main Authors Cai, Qing-Yuan, Luo, Hai-Han, Zheng, Yu-Xiang, Liu, Ding-Quan
Format Journal Article
LanguageEnglish
Published United States 12.08.2013
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ISSN1094-4087
1094-4087
DOI10.1364/OE.21.019163

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Summary:Cut-off filters are usually operating at oblique incidence and exhibit polarization dependence properties. We propose a simple approach to design cut-off filters with low linear polarization sensitivity (LPS) based on dielectric-metal-dielectric (DMD) stacks. The designing method is derived from the theory of optical film characteristic matrix. The admittance loci of the film are adjusted to achieve similar spectral properties of s- and p-polarized light at oblique incidence. Different film structures are designed non-polarizing at different angles of incidence with the method. The results show that the designing method is efficient for designing non-polarizing cut-off filters, which are widely used in non-polarizing optical system.
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ISSN:1094-4087
1094-4087
DOI:10.1364/OE.21.019163