Non-sticky polyvinylsilazane stamp with high durability for UV-nanoimprint lithography

• Published in: Microelectronic engineering Vol. 98; pp. 130 - 133
• Main Authors: Park, Hyun-Ha, Park, Sungjune, Kim, Hana, Lim, HyungJun, Kim, Dong-Pyo, Lee, JaeJong
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01.10.2012; Elsevier
• Subjects: Applied sciences; Cross-disciplinary physics: materials science; rheology; Electronics; Exact sciences and technology; Materials science; Metals. Metallurgy; Methods of nanofabrication; Microelectronic fabrication (materials and surfaces technology); Nanolithography; Nanoscale pattern formation; Ormostamp; Physics; Production techniques; PVSZ (polyvinylsilazane); Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Surface treatment; UV-nanoimprint lithography; Working stamp; PVSZ (polyvinylsilazane); UV-nanoimprint lithography; Working stamp; Ormostamp; Radiation hardening; Heat treatment; Glass; Durability; Contact angle; Nanolithography; Coatings; Adhesion; Coated material; Hydrolysis; Ammonia; Microelectronic fabrication; Ultraviolet radiation; UV lithography; Polyurethane; Feasibility; Reliability; Photolithography; Resins; Surface energy
• ISSN: 0167-9317; 1873-5568
• DOI: 10.1016/j.mee.2012.07.071

[Display omitted] ► Working stamp needs anti-adhesion layer for step and NIL repetition. ► We fabricated working stamps using PVSZ and Ormostamp materials. ► After repetition imprints, PVSZ stamp could be maintained contact angle. ► PVSZ stamp no needs surface modification and be used as an ideal stamp. The feasibility of a sustainable imprint-working stamp made of polyvinylsilazane (PVSZ) is demonstrated. As a control stamp, the Ormostamp, which was typically used as an anti-sticky imprint-working stamp in previous related studies, was used. For the comparing experiments, two types of stamp using Ormostamp and PVSZ were prepared. The working stamp was fabricated by placing a defined amount of UV-curable material on the master stamp and UV curing. For the Ormostamp material, after the cured working stamp was detached from the master stamp, BGL-GZ-83 was coated on the surface of the working stamp and heat treatment was performed. For the PVSZ material, after the cured working stamp was detached from the master stamp, it was subject to heat treatment and hydrolysis treatment in vaporized aqueous ammonia. The nanoimprinting process was repeatedly carried out within polyurethane acrylate (PUA) resin. For the qualitative measurement of increasing surface energy after repeated imprinting, the contact angle of the working stamp made of Ormostamp material and PVSZ was measured before and after the imprinting experiment. According to the contact angle results of the Ormostamp and PVSZ, the PVSZ could be used as a more sustainable imprint-working stamp material than the Ormostamp. Accordingly, a PVSZ working stamp was successfully formed on a glass substrate with an anti-adhesion surface for UV-nanoimprint lithography.