Photocatalytic degradation characteristic of amorphous TiO2-W thin films deposited by magnetron sputtering

• Published in: Transactions of Nonferrous Metals Society of China Vol. 16; no. B01; pp. 280 - 284
• Main Author: 黄佳木 李月霞 赵国栋 蔡小平
• Format: Journal Article
• Language: English
• Published: College of Materials Science and Engineering, Chongqing University, Chongqing 400045, China 01.06.2006
• Subjects: 光催化剂; 光催化降解特性; 沉积; 磁控管溅射法; 非晶态TiO2-W薄膜; amorphous TiO2; magnetron sputtering; TiO2-W thin films; threshold; photocatalysis
• ISSN: 1003-6326
• DOI: 10.1016/S1003-6326(06)60191-X

TiO2-W films were deposited on the slides by reactive magnetron sputtering. Properties of the films were analyzed via AFM, XRD, XPS, STS, UV-Vis and ellipse polarization apparatus. The results show that TiO2-W films are amorphous. The AFM map reveals that the surface of the film is tough and porous. The experiments of decomposing methylene blue indicate that the thickness threshold on these films is 141 nm, at which the rate ofphotodegradation is 90% in 2 h. And when the thickness is over 141 ran, the rate of photodegradation does not increase any more. This result is completely different from that of crystalloid TiO2 thin film.