Hybrid functional IrO2-TiO2 thin film resistor prepared by atomic layer deposition for thermal inkjet printheads

• Published in: Transactions of Nonferrous Metals Society of China Vol. 21; no. 1; pp. 88 - 91
• Main Authors: KWACK, Won-Sub, MOON, Hyoung-Seok, JEONG, Seong-Jun, WANG, Qi-min, Kwon, Se-Hun
• Format: Journal Article
• Language: English
• Published: National Core Research Center for Hybrid Materials Solution,Pusan National University, Busan 609-735, Korea%Department of Materials Science and Engineering,Korea Advanced Institute of Science and Technology, Daejon 373-1, Korea 01.03.2011
• Subjects: IrO2; TiO2薄膜; 二氧化钛; 制备; 原子层沉积; 喷墨打印头; 沉积法; 薄膜电阻; IrO2-TiO2 film; heating resistor; inkjet
• ISSN: 1003-6326
• DOI: 10.1016/S1003-6326(11)61067-4

IrO2-TiO2 thin films were prepared by atomic layer deposition using Ir（EtCp）（COD） and titanium isopropoxide （TTIP）. The resistivity of IrO2-TiO2 thin films can be easily controlled from 1 500 to 356.7 μΩ·cm by the IrO2 intermixing ratio from 0.55 to 0.78 in the IrO2-TiO2 thin films. The low temperature coefficient of resistance（TCR） values can be obtained by adopting IrO2-TiO2 composite thin films. Moreover, the change in the resistivity of IrO2-TiO2 thin films was below 10% even after O2 annealing process at 600 ℃. The step stress test results show that IrO2-TiO2 films have better characteristics than conventional TaN08 heater resistor. Therefore, IrO2-TiO2 composite thin films can be used as a heater resistor material in thermal inkjet printhead.