Fabrication of large-area nano-scale patterned sapphire substrate with laser interference lithography
Periodic triangle truncated pyramid arrays are successfully fabricated on the sapphire substrate by a low-cost and high-efficiency laser interference lithography（LIL）system.Through the combination of dry etching and wet etching techniques,the nano-scale patterned sapphire substrate（NPSS）with uniform...
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| Published in | Optoelectronics letters Vol. 10; no. 1; pp. 51 - 54 |
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| Main Author | |
| Format | Journal Article |
| Language | English |
| Published |
Berlin/Heidelberg
Springer Berlin Heidelberg
2014
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| Subjects | |
| Online Access | Get full text |
| ISSN | 1673-1905 1993-5013 |
| DOI | 10.1007/s11801-014-3188-6 |
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| Abstract | Periodic triangle truncated pyramid arrays are successfully fabricated on the sapphire substrate by a low-cost and high-efficiency laser interference lithography（LIL）system.Through the combination of dry etching and wet etching techniques,the nano-scale patterned sapphire substrate（NPSS）with uniform size is prepared.The period of the patterns is 460 nm as designed to match the wavelength of blue light emitting diode（LED）.By improving the stability of the LIL system and optimizing the process parameters,well-defined triangle truncated pyramid arrays can be achieved on the sapphire substrate with diameter of 50.8 mm.The deviation of the bottom width of the triangle truncated pyramid arrays is 6.8%,which is close to the industrial production level of 3%. |
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| AbstractList | Periodic triangle truncated pyramid arrays are successfully fabricated on the sapphire substrate by a low-cost and high-efficiency laser interference lithography (LIL) system. Through the combination of dry etching and wet etching techniques, the nano-scale patterned sapphire substrate (NPSS) with uniform size is prepared. The period of the patterns is 460 nm as designed to match the wavelength of blue light emitting diode (LED). By improving the stability of the LIL system and optimizing the process parameters, well-defined triangle truncated pyramid arrays can be achieved on the sapphire substrate with diameter of 50.8 mm. The deviation of the bottom width of the triangle truncated pyramid arrays is 6.8%, which is close to the industrial production level of 3%. Periodic triangle truncated pyramid arrays are successfully fabricated on the sapphire substrate by a low-cost and high-efficiency laser interference lithography（LIL）system.Through the combination of dry etching and wet etching techniques,the nano-scale patterned sapphire substrate（NPSS）with uniform size is prepared.The period of the patterns is 460 nm as designed to match the wavelength of blue light emitting diode（LED）.By improving the stability of the LIL system and optimizing the process parameters,well-defined triangle truncated pyramid arrays can be achieved on the sapphire substrate with diameter of 50.8 mm.The deviation of the bottom width of the triangle truncated pyramid arrays is 6.8%,which is close to the industrial production level of 3%. |
| Author | 禤铭东 戴隆贵 贾海强 陈弘 |
| AuthorAffiliation | Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China |
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| CitedBy_id | crossref_primary_10_1007_s11801_016_5251_y crossref_primary_10_1016_j_optlastec_2023_110205 crossref_primary_10_1049_iet_opt_2018_5028 crossref_primary_10_1007_s11801_016_6097_z crossref_primary_10_1007_s11801_016_6023_4 crossref_primary_10_1088_1674_1056_26_5_054203 |
| Cites_doi | 10.1364/OE.19.001065 10.1109/LED.2011.2177806 10.1149/1.3617468 10.1364/OL.36.003176 10.1016/j.mee.2013.03.055 10.1016/j.jcrysgro.2009.01.055 10.1038/386351a0 10.1063/1.3631823 10.1016/j.tsf.2010.11.043 10.1016/j.cap.2010.11.032 10.1149/2.018203esl 10.1364/OE.20.011423 10.1166/jnn.2011.3281 10.1016/j.optcom.2010.11.065 10.1016/j.jcrysgro.2006.02.020 10.1002/pssc.200983551 10.1002/adma.201101888 |
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| Keywords | Light Extraction Efficiency Sapphire Substrate Tetra Methyl Ammonium Hydroxide Epitaxial Lateral Overgrowth Bottom Width |
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| Notes | XUAN Ming-dong , DAI Long-gui, JIA Hai-qiang , and CHEN Hong （ Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China） 12-1370/TN Periodic triangle truncated pyramid arrays are successfully fabricated on the sapphire substrate by a low-cost and high-efficiency laser interference lithography（LIL）system.Through the combination of dry etching and wet etching techniques,the nano-scale patterned sapphire substrate（NPSS）with uniform size is prepared.The period of the patterns is 460 nm as designed to match the wavelength of blue light emitting diode（LED）.By improving the stability of the LIL system and optimizing the process parameters,well-defined triangle truncated pyramid arrays can be achieved on the sapphire substrate with diameter of 50.8 mm.The deviation of the bottom width of the triangle truncated pyramid arrays is 6.8%,which is close to the industrial production level of 3%. |
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| SubjectTerms | Lasers Optical Devices Optics Photonics Physics Physics and Astronomy 制造 图案化 基板 干涉光刻 激光干涉 纳米级 蓝宝石衬底 面积 |
| Title | Fabrication of large-area nano-scale patterned sapphire substrate with laser interference lithography |
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