Fabrication of large-area nano-scale patterned sapphire substrate with laser interference lithography

• Published in: Optoelectronics letters Vol. 10; no. 1; pp. 51 - 54
• Main Author: 禤铭东 戴隆贵 贾海强 陈弘
• Format: Journal Article
• Language: English
• Published: Berlin/Heidelberg Springer Berlin Heidelberg 2014
• Subjects: Lasers; Optical Devices; Optics; Photonics; Physics; Physics and Astronomy; 制造; 图案化; 基板; 干涉光刻; 激光干涉; 纳米级; 蓝宝石衬底; 面积; Light Extraction Efficiency; Sapphire Substrate; Tetra Methyl Ammonium Hydroxide; Epitaxial Lateral Overgrowth; Bottom Width
• ISSN: 1673-1905; 1993-5013
• DOI: 10.1007/s11801-014-3188-6

Periodic triangle truncated pyramid arrays are successfully fabricated on the sapphire substrate by a low-cost and high-efficiency laser interference lithography（LIL）system.Through the combination of dry etching and wet etching techniques,the nano-scale patterned sapphire substrate（NPSS）with uniform size is prepared.The period of the patterns is 460 nm as designed to match the wavelength of blue light emitting diode（LED）.By improving the stability of the LIL system and optimizing the process parameters,well-defined triangle truncated pyramid arrays can be achieved on the sapphire substrate with diameter of 50.8 mm.The deviation of the bottom width of the triangle truncated pyramid arrays is 6.8%,which is close to the industrial production level of 3%.